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Band alignment at a nonplanar Si/SiO_2 interface

机译:非平面Si / SiO_2界面的能带对准

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The interfacial electronic properties of silicon nanocrystals embedded in a silica matrix are studied using ab initio density-functional theory. We aim to obtain local band edges for a typical nanostructured system, nanocrystals embedded in a surrounding matrix. We compute the spatial variation in the electronic structure for realistic Si nanocrystals with nominal diameters ranging between 0.8 and 1.6 nm, i.e., up to systems with more than 1000 atoms. The evolution of the valence and conduction band edges between Si nanocrystals and amorphous silica along radial directions versus size is presented. Significant differences are found comparing embedded Si nanocrystals and planar Si/SiO_2 interfaces.
机译:使用从头算密度函数理论研究了嵌入二氧化硅基质中的硅纳米晶体的界面电子性能。我们旨在获得典型纳米结构系统的局部能带边缘,即嵌入周围基质中的纳米晶体。我们计算出名义直径在0.8到1.6 nm之间的现实Si纳米晶体的电子结构的空间变化,即直至具有超过1000个原子的系统。给出了硅纳米晶体和非晶态二氧化硅之间的价键和导带边沿径向相对于尺寸的演变。比较嵌入式Si纳米晶体和平面Si / SiO_2界面,发现存在显着差异。

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