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Lowest order in inelastic tunneling approximation: Efficient scheme for simulation of inelastic electron tunneling data

机译:非弹性隧穿近似的最低阶:模拟非弹性电子隧穿数据的有效方案

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摘要

We have developed an efficient and accurate formalism which allows the simulation at the ab initio level of inelastic electron tunneling spectroscopy data under a scanning tunneling microscope setup. It exploits fully the tunneling regime by carrying out the structural optimization and vibrational mode calculations for surface and tip independently. The most relevant interactions in the inelastic current are identified as the inelastic tunneling terms, which are taken into account up to lowest order, while all other inelastic contributions are neglected. As long as the system is under tunneling regime conditions and there is no physisorbed molecule on the surface or tip apex, this lowest order in inelastic tunneling (LOIT) approach reduces drastically the computational cost compared to related approaches while maintaining a good accuracy. Adopting the wide-band limit for both tip and surface further reduces calculation times significantly, and is shown to give similar results to when the full energy dependence of the Green's functions is taken into account. The LOIT is applied to the Cu(111) + CO system probed by a clean and a CO contaminated tip to find good agreement with previous works. Different parameters involved in the calculations such as basis sets, k sampling, tip-sample distance, or temperature, among others, are discussed in detail.
机译:我们已经开发出一种高效且准确的形式主义,该形式主义允许在扫描隧道显微镜设置下从头开始对非弹性电子隧道光谱数据进行仿真。它通过独立进行表面和尖端的结构优化和振动模式计算来充分利用隧道技术。在非弹性流中最相关的相互作用被确定为非弹性隧穿项,这些项被考虑到最低顺序,而所有其他非弹性贡献都被忽略了。只要系统处于隧穿状态条件下,并且表面或尖端顶点上没有任何物理吸附的分子,则与相关方法相比,非弹性隧穿(LOIT)方法的最低阶数可大大降低计算成本,同时保持良好的准确性。对尖端和表面采用宽带限制可进一步显着减少计算时间,并且显示出与考虑格林函数的全能量依赖性时相似的结果。 LOIT用于清洁的,受CO污染的尖端探测到的Cu(111)+ CO系统,以发现与先前的工作有很好的一致性。详细讨论了计算中涉及的不同参数,例如基本集,k采样,尖端采样距离或温度等。

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