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首页> 外文期刊>Physical review >Role of microstructure on optical properties in high-uniformity In_(1-x)Ga_xAs nanowire arrays: Evidence of a wider wurtzite band gap
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Role of microstructure on optical properties in high-uniformity In_(1-x)Ga_xAs nanowire arrays: Evidence of a wider wurtzite band gap

机译:微观结构对高均匀度In_(1-x)Ga_xAs纳米线阵列中光学特性的作用:纤锌矿带隙更宽的证据

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摘要

Accessing fundamental structure-property correlations in ternary semiconductor nanowires is a challenging endeavor often limited by large compositional inhomogeneities. Here, we investigate strongly periodic In_(1-x)Ga_xAs nanowire arrays grown on Si with very high compositional uniformity to identify the role of microstructural features (crystal phase and stacking order) on the phonon and optical properties via transmission electron microscopy, Raman, and photoluminescence spectroscopy. Depending on Ga content and growth kinetics, we show that the nanowire microstructure changes consistently from a wurtzite-dominated stacking to a disordered layer stacking, with broadened Raman modes, upon tuning the composition from In-rich to more Ga-rich In_(1-x)Ga_xAs. Consequently, higher-quality wurtzite stacking leads to enhanced photoluminescence emission intensities and, most strikingly, a blue-shift in the emission energy of ~30-40 meV with respect to the bulk In_(1-x)Ga_xAs phase. This finding supports the theoretically predicted larger band-gap energy of composition-tuned wurtzite-type In_(1-x)Ga_xAs.
机译:在三元半导体纳米线中访问基本的结构-属性相关性是一项挑战性的工作,通常会受到较大的组成不均匀性的限制。在这里,我们研究了以非常高的组成均匀性在Si上生长的强周期In_(1-x)Ga_xAs纳米线阵列,以通过透射电子显微镜,通过拉曼光谱,确定微结构特征(晶相和堆积顺序)对声子和光学性质的作用。和光致发光光谱。根据Ga含量和生长动力学,我们表明,在将成分从富In转变为富Ga的In_(1-)时,纳米线微观结构从纤锌矿为主的堆叠变为无序层堆叠,并具有更宽的拉曼模式。 x)Ga_xAs。因此,更高质量的纤锌矿堆叠导致增强的光致发光发射强度,最显着的是,相对于整体In_(1-x)Ga_xAs相,发射能量的蓝移约为30-40 meV。这一发现支持了成分调谐纤锌矿型In_(1-x)Ga_xAs在理论上的更大的带隙能量。

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  • 来源
    《Physical review》 |2013年第20期|205303.1-205303.9|共9页
  • 作者单位

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany,Institute for Advanced Study, Technische Universitaet Muenchen, Garching, 85748, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

    Department of Chemistry, Ludwig-Maximilians- Universitaet Muenchen, Munich, 81377, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

    Institute for Nanoelectronics, Technische Universitaet Muenchen, Munich, 80333, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

    Institute for Nanoelectronics, Technische Universitaet Muenchen, Munich, 80333, Germany;

    Institute for Nanoelectronics, Technische Universitaet Muenchen, Munich, 80333, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany,Institute for Advanced Study, Technische Universitaet Muenchen, Garching, 85748, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany,Institute for Advanced Study, Technische Universitaet Muenchen, Garching, 85748, Germany;

    Walter Schottky Institut, Physik Department, and Center of Nanotechnology and Nanomaterials, Technische Universitaet Muenchen,Garching, 85748, Germany;

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  • 关键词

    Ⅲ-Ⅴ semiconductors;

    机译:Ⅲ-Ⅴ族半导体;

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