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Consistent treatment of charged systems within periodic boundary conditions: The projector augmented-wave and pseudopotential methods revisited

机译:在周期边界条件下对带电系统的一致处理:重新讨论了投影仪的增强波和伪势方法

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The ab initio calculation of charged defect properties in solids is not straightforward because of the delicate interplay between the long-range Coulomb interaction and the periodic boundary conditions. We derive the projector augmented-wave (PAW) energy and Hamiltonian with special care taken on the potentials from the Coulomb interaction. By explicitly treating the background compensation charge, we find additional terms in the total energy of the charged cells and in the potential. We show that these background terms are needed to accurately reproduce all-electron calculations of the formation energy of a charged defect. In particular, the previous PAW expressions were spuriously sensitive to the pseudization conditions and this artifact is removed by the background term. This PAW derivation also provides insights into the norm-conserving pseudopotential framework. We propose then an alternative definition for the total energy of charged cells and for the Kohn-Sham potential within this framework that better approximates the all-electron results.
机译:由于长距离库仑相互作用和周期性边界条件之间的微妙相互作用,固体中带电缺陷性质的从头算是不容易的。我们特别考虑了库仑相互作用的电势,得出了投影仪的增强波(PAW)能量和哈密顿量。通过明确处理背景补偿电荷,我们在带电电池的总能量和电势中找到了其他术语。我们表明需要这些背景项来精确地重现带电缺陷形成能的全电子计算。特别是,先前的PAW表达式对伪造条件具有假性的敏感性,并且该伪像已由背景项消除。该PAW派生还提供了对守恒伪势框架的见解。然后,我们为带电电池的总能量和该框架内的Kohn-Sham势提出了另一种定义,它可以更好地近似全电子结果。

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  • 来源
    《Physical review 》 |2014年第4期| 045116.1-045116.13| 共13页
  • 作者单位

    CEA, DEN, Service de Recherches de Metallurgie Physique, F-91191 Gif-sur-Yvette, France;

    CEA, DEN, Service de Recherches de Metallurgie Physique, F-91191 Gif-sur-Yvette, France;

    European Theoretical Spectroscopy Facility, Institute of Condensed Matter and Nanosciences, Universite catholique de Louvain, Chemin des etoiles 8, bte L07.03.01, B-1348 Louvain-la-neuve, Belgium;

    CEA, DAM, DIF, F-91297 Arpajon, France;

    CEA, DAM, DIF, F-91297 Arpajon, France;

    CEA, DAM, DIF, F-91297 Arpajon, France;

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