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Three-layer model for the surface second-harmonic generation yield including multiple reflections

机译:包含多次反射的表面二次谐波产生量的三层模型

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We present the three-layer model to calculate the surface second-harmonic generation (SSHG) yield. This model considers that the surface is represented by three regions or layers. The first layer is the vacuum region with a dielectric function ∈_υ(ω) = 1 from where the fundamental electric field impinges on the material. The second layer is a thin layer (ℓ) of thickness d characterized by a dielectric function ∈_ℓ(ω), and it is in this layer where the SSHG takes place. The third layer is the bulk region denoted by b and characterized by ∈_b(ω). Both the vacuum and bulk layers are semi-infinite. The model includes the multiple reflections of both the fundamental and the second-harmonic (SH) fields that take place at the thin layer ℓ. We obtain explicit expressions for the SSHG yield for the commonly used s and p polarizations of the incoming 1ω and outgoing 2ω electric fields, where no assumptions for the symmetry of the surface are made. These symmetry assumptions ultimately determine which components of the surface nonlinear second-order susceptibility tensor χ(-2ω; ω,ω) are different from zero, and thus contribute to the SSHG yield. Then, we particularize the results for the most commonly investigated surfaces, the (001), (110), and (111) crystallographic faces, taking their symmetries into account. We use the three-layer model and compare it against the experimental results of a Si(111)(1 × 1):H surface, as a test case, and use it to predict the SSHG yield of a Si(001)(2 × 1) surface.
机译:我们提出了三层模型来计算表面次谐波产生(SSHG)产量。该模型认为表面由三个区域或层表示。第一层是具有介电函数∈_υ(ω)= 1的真空区域,基波从该区域入射到材料上。第二层是厚度为d的薄层(ℓ),其特征是介电函数∈_ℓ(ω),并且在该层中发生SSHG。第三层是用b表示并以∈_b(ω)为特征的块状区域。真空层和体层都是半无限的。该模型包括在薄层place上发生的基本和二次谐波(SH)场的多次反射。我们获得了传入的1ω和传出的2ω电场的常用s和p极化的SSHG产量的显式表达式,其中没有为表面的对称性做任何假设。这些对称性的假设最终确定了表面非线性二阶磁化率张量χ(-2ω;ω,ω)的哪些分量不为零,从而有助于SSHG产量。然后,我们将最常研究的表面(001),(110)和(111)晶面的对称性考虑在内,具体化了结果。我们使用三层模型,并将其与Si(111)(1×1):H表面的实验结果进行比较,作为测试案例,并使用它来预测Si(001)(2)的SSHG产量×1)表面。

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