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首页> 外文期刊>Physical review letters >Resonant Charge Transfer of Hydrogen Rydberg Atoms Incident on a Cu(100) Projected Band-Gap Surface
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Resonant Charge Transfer of Hydrogen Rydberg Atoms Incident on a Cu(100) Projected Band-Gap Surface

机译:氢里德堡原子在Cu(100)投影带隙表面上入射的共振电荷转移

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摘要

The charge transfer (ionization) of hydrogen Rydberg atoms (n = 25-34) incident on a Cu(100) surface is investigated. Unlike fully metallic surfaces, where the Rydberg electron energy is degenerate with the conduction band of the metal, the Cu(100) surface has a projected band gap at these energies, and only discrete image states are available through which charge transfer can take place. Resonant enhancement of charge transfer is observed for Rydberg states whose energy matches one of the image states, and the integrated surface ionization signals (signal versus applied field) show clear periodicity as a function of n as the energies come in and out of resonance with the image states. The surface ionization dynamics show a velocity dependence; decreased velocity of the incident H atom leads to a greater mean distance of ionization and a lower field required to extract the ion. The surface ionization profiles for "on resonance" n values show a changing shape as the velocity is changed, reflecting the finite field range over which resonance occurs.
机译:研究了氢里德堡原子(n = 25-34)入射到Cu(100)表面上的电荷转移(电离)。与全金属表面不同,里德堡电子能量随着金属的导带而退化,Cu(100)表面在这些能量下具有投影带隙,并且仅离散的图像状态可用,通过该状态可以进行电荷转移。对于能量匹配图像状态之一的里德堡状态,观察到电荷转移的共振增强,并且随着能量的进出共振,积分的表面电离信号(信号与外加电场)显示出明显的周期性,随n的变化。图像状态。表面电离动力学表现出速度依赖性。降低的入射H原子速度会导致更长的平均电离距离和更低的提取离子场。随着速度的变化,“在共振时” n值的表面电离曲线显示出变化的形状,反映了发生共振的有限场范围。

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  • 来源
    《Physical review letters》 |2015年第9期|093201.1-093201.5|共5页
  • 作者单位

    Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England;

    Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England;

    Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England;

    Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England;

    Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England;

    Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England;

    Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England;

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