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Ferromagnetism in post-annealed sputtered Cr-doped In_2O_3 thin films

机译:退火后溅射Cr掺杂In_2O_3薄膜的铁磁性

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摘要

In the present work, we have studied the effect of a post-annealing process on the magnetic properties of thin films of Cr-doped indium oxide, In_(2_x)Cr_xO_(3-δ). Samples with low stoichiometrie oxygen deficiency, S, which is required for ferromagnetic behavior, were fabricated using a DC/RF magnetron sputtering method. The post-annealing process described in this paper allows control of the oxygen deficiency. This method has led to samples which show clear ferromagnetic behavior at both low temperatures and at room temperature with saturation magnetic moments up to ~1.5μ_B/Cr-atoms. The measured high Curie temperature, T_C~740K, justifies the indirect electron-mediated ferromagnetic coupling of the spins of Cr ions. The ferromagnetic coupling was found to be mostly a bulk effect, which is not affected by the surface of the film.
机译:在当前的工作中,我们研究了后退火工艺对掺杂Cr的氧化铟In_(2_x)Cr_xO_(3-δ)薄膜的磁性的影响。使用DC / RF磁控管溅射法制备了具有低化学计量比的氧缺陷S的铁磁性行为所需的样品。本文所述的后退火工艺可以控制氧气不足。该方法导致样品在低温和室温下均表现出清晰的铁磁行为,且饱和磁矩高达〜1.5μB/ Cr原子。测得的居里高温T_C〜740K证明了Cr离子自旋的间接电子介导的铁磁耦合。发现铁磁耦合主要是体积效应,不受膜表面的影响。

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  • 来源
    《Physica status solidi》 |2013年第12期|2644-2649|共6页
  • 作者单位

    Department of Electrical and Computer Engineering, Center for Electromagnetic Materials and Optical Systems, University of Massachusetts, Lowell, Massachusetts 01854, USA;

    Department of Electrical and Computer Engineering, Center for Electromagnetic Materials and Optical Systems, University of Massachusetts, Lowell, Massachusetts 01854, USA;

    Department of Physics, University of Massachusetts, Lowell, Massachusetts 01854, USA;

    Department of Electrical and Computer Engineering, Center for Electromagnetic Materials and Optical Systems, University of Massachusetts, Lowell, Massachusetts 01854, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    annealing; ferromagnetic properties; In_2O_3; oxygen deficiency; sputtering; thin films;

    机译:退火;铁磁性能In_2O_3;缺氧溅射薄膜;

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