首页> 外文期刊>Photovoltaics, IEEE Journal of >Enhancement of Stability by Applying HAT-CN for Hole Modification With Good Water Resistance and Hole Extraction
【24h】

Enhancement of Stability by Applying HAT-CN for Hole Modification With Good Water Resistance and Hole Extraction

机译:用良好的耐水性和孔提取应用HAT-CN来增强稳定性

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

A creative application of using HAT-CN as a hole modification layer (HML) in positive perovskite solar cells (PSCs) is demonstrated herein. This measure successfully improves the performance of devices in many aspects. Although HAT-CN owns a similar position of Fermi level with MoO3, there have been proved to be a much smoother interface. The devices using HAT-CN had a higher V-oc at 1.10 V over 1.06 V that was shown by devices using MoO3. Optimized devices remained PCE over 18% for 188 h resulting from compressing recombination better for owning higher hydrophobicity. The measure that using HAT-CN for modification proposed in this work was proved that HAT-CN provides a better ability of extracting holes and owns better water-resistance to be more stable.
机译:本文在此证明了使用帽CN作为阳性钙钛矿太阳能电池(PSC)的空穴改性层(HML)的创造性应用。这项措施成功提高了许多方面的设备的性能。虽然Hat-CN拥有与Moo3的费米水平相似的位置,但已被证明是一个更平滑的界面。使用HAT-CN的器件具有较高的V-OC,在1.06V的1.0 v,通过使用MOO3所示的装置显示。 188小时的优化器件持续超过18%,从而对具有更高的疏水性更好的压缩重组。证明了使用帽子CN进行修改的措施,证明了帽子CN提供更好的提取孔的能力,并拥有更好的防水性以更稳定。

著录项

  • 来源
    《Photovoltaics, IEEE Journal of》 |2020年第4期|1023-1026|共4页
  • 作者单位

    Soochow Univ Jiangsu Key Lab Carbon Based Funct Mat & Devices Suzhou 215123 Peoples R China|Soochow Univ Inst Funct Nano & Soft Mat FUNSOM Suzhou 215123 Peoples R China;

    Soochow Univ Jiangsu Key Lab Carbon Based Funct Mat & Devices Suzhou 215123 Peoples R China|Soochow Univ Inst Funct Nano & Soft Mat FUNSOM Suzhou 215123 Peoples R China;

    Soochow Univ Jiangsu Key Lab Carbon Based Funct Mat & Devices Suzhou 215123 Peoples R China|Soochow Univ Inst Funct Nano & Soft Mat FUNSOM Suzhou 215123 Peoples R China;

    Soochow Univ Jiangsu Key Lab Carbon Based Funct Mat & Devices Suzhou 215123 Peoples R China|Soochow Univ Inst Funct Nano & Soft Mat FUNSOM Suzhou 215123 Peoples R China;

    Soochow Univ Jiangsu Key Lab Carbon Based Funct Mat & Devices Suzhou 215123 Peoples R China|Soochow Univ Inst Funct Nano & Soft Mat FUNSOM Suzhou 215123 Peoples R China;

    Soochow Univ Jiangsu Key Lab Carbon Based Funct Mat & Devices Suzhou 215123 Peoples R China|Soochow Univ Inst Funct Nano & Soft Mat FUNSOM Suzhou 215123 Peoples R China;

    Soochow Univ Jiangsu Key Lab Carbon Based Funct Mat & Devices Suzhou 215123 Peoples R China|Soochow Univ Inst Funct Nano & Soft Mat FUNSOM Suzhou 215123 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    HAT-CN; hole modification layer; MoO3; stability;

    机译:帽子CN;孔改性层;MOO3;稳定性;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号