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High-efficiency and stable quantum dot light-emitting diodes with staircase V_2O_5/PED0T:PSS hole injection layer interface barrier

机译:具有阶梯V_2O_5 / PED0T:PSS空穴注入层界面势垒的高效稳定量子点发光二极管

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摘要

The main bottleneck causing lags in the application of transition metal oxides as substitutes for poly (3,4-eth-ylenedioxythiophene):poly (styrene-sulfonate) (PEDOT:PSS) are the relatively low level efficiencies of quantum dot light-emitting diodes (QLEDs), even though they can improve a device's stability. High-performance QLEDs are fabricated with long lifetimes using low-cost, reliable and all-solution-processed hole injection materials with a double hole injection layer (HIL) structure. Vanadium oxide CV_2O_5)/PEDOT:PSS double HILs offer a small staircase interface barrier, which enhance the hole injection and achieve a better charge balance. By using this double HIL regular planar architecture device, the maximum external quantum efficiency (η_(EQE)) reaches 18.09% and over 13355 h of lifetime. The related control PEDOT:PSS-based and V_2O_5-based QLEDs have maximum η_(EQE) of 13.79% and 9.13% with 6117 and 30881 h of lifetime, respectively. Due to the enhanced hole injection with the staircase interface barrier, the double HIL architecture QLEDs also have a high η_(EQE) above 15.00% over a wide range of 900-26000 cd m~(-2) with a low efficiency roll-off. These discoveries support the use of inorganic transition metal oxides as HILs for QLEDs with high efficiency and brightness for long operational lifetimes.
机译:过渡金属氧化物替代聚(3,4-乙撑二氧噻吩):聚(苯乙烯磺酸盐)(PEDOT:PSS)的替代应用的主要瓶颈是量子点发光二极管的相对较低水平的效率(QLED),即使它们可以提高设备的稳定性。高性能QLED使用具有双空穴注入层(HIL)结构的低成本,可靠且经过全溶液处理的空穴注入材料制成,使用寿命长。氧化钒CV_2O_5)/ PEDOT:PSS双HIL提供较小的阶梯界面势垒,可增强空穴注入并实现更好的电荷平衡。通过使用这种双HIL常规平面架构器件,最大外部量子效率(η_(EQE))达到18.09%,并且使用寿命超过13355小时。相关的基于PEDOT:PSS和基于V_2O_5的控制QLED的最大η_(EQE)分别为6117和30881小时,最大η_(EQE)为13.79%和9.13%。由于采用了阶梯式界面势垒增强了空穴注入,因此双HIL架构QLED在900-26000 cd m〜(-2)的宽范围内也具有高于15.00%的η_(EQE)高,且滚降效率低。这些发现支持将无机过渡金属氧化物用作QLED的HIL,具有高效率和高亮度,可延长使用寿命。

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