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Suitable materials for elastico mechanoluminescence-based stress sensors

机译:适用于基于弹性机械发光的应力传感器的材料

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摘要

Whereas the elastico mechanoluminescence (EML) of certain crystals increases linearly with the stress, nonlinearity occurs in the EML intensity versus stress plot of several crystals. The EML of crystals can be understood on the basis of piezoelectrically-induced detrapping model, whereby the localized piezoelectric field causes detrapping of electrons or holes and subsequently the capture of electrons in the excited states of activator ions, recombination of electrons in hole captured centres, recombination of holes in electron-captured centres or simply the electron-hole recombination gives rise to the light emission. Considering the piezoelectrically-induced detrapping model of EML expression is derived for the stress dependence of the EML intensity. It is shown that the crystals having uniform distribution of traps show linear relationship between the EML intensity and stress and the crystals having exponential distribution of traps show nonlinear relationship between the EML intensity and stress. The crystals having linear dependence of EML intensity on stress are suitable for the fabrication of EML-based stress sensors. The values of coefficient of deformation detrapping, relaxation time of the crosshead of the machine used to deform the samples and lifetime of the charge carriers in the shallow traps lying in the normal piezoelectric region of the crystals can be determined from the EML measurements. The values of the coefficient of deformation detrapping are 0.310,0.018 and 0.021 MPa~(-1) for SrMgAl_6O_11:Eu, Sr_2MgSi_2O_7:Eu and SrCaMgSi_2O_7:Eu crystals, respectively. The coefficient of deformation detrapping is low for SrAl_2O_4:Eu, SrAl_2O_4:Eu, Dy, SrCaMgSi_2O_7:Eu and ZnS:Mn crystals and such crystals are suitable for EML-based stress sensors. A good agreement is found between the theoretical and experimental results.
机译:某些晶体的弹性机械发光(EML)随着应力线性增加,而若干晶体的EML强度与应力图则出现非线性。晶体的EML可以基于压电感应的去陷阱模型来理解,其中局部的压电场会导致电子或空穴的去陷阱,并随后在活化剂离子的激发态下捕获电子,在空穴捕获中心重新结合电子,电子俘获中心中的空穴的重组或简单地电子-空穴重组引起发光。考虑到EML强度的应力依赖性,推导了压电诱导的EML表达的脱模模型。结果表明,陷阱分布均匀的晶体在EML强度和应力之间呈线性关系,陷阱指数分布的晶体在EML强度与应力之间呈非线性关系。 EML强度对应力具有线性依赖性的晶体适用于制造基于EML的应力传感器。可以从EML测量值中确定变形陷阱系数,用于使样品变形的机器的十字头的松弛时间以及位于晶体正常压电区内的浅陷阱中的电荷载流子的寿命值。 SrMgAl_6O_11:Eu,Sr_2MgSi_2O_7:Eu和SrCaMgSi_2O_7:Eu晶体的形变俘获系数分别为0.310、0.018和0.021 MPa〜(-1)。对于SrAl_2O_4:Eu,SrAl_2O_4:Eu,Dy,SrCaMgSi_2O_7:Eu和ZnS:Mn晶体,形变俘获系数较低,并且此类晶体适用于基于EML的应力传感器。理论和实验结果之间找到了很好的一致性。

著录项

  • 来源
    《Optical Materials》 |2011年第1期|p.194-200|共7页
  • 作者

    V.K. Chandra; B.P. Chandra;

  • 作者单位

    Department of Electrical and Electronics Engineering Chhatrapati Shivaji Institute of Technology Shivaji Nagar Kolihapuri Durg (C.C.) 497 001 India;

    Disha Academy of Research and Education Disha Institute of Management and Technology Satya Vihar Vidhansabha-Chandrakhuri Marg Raipur 492 101 India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    mechanoluminescence; triboluminescence; stress sensors; detrapping; phosphors;

    机译:机械发光荧光发光压力传感器;诱捕荧光粉;

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