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Dual-mode snapshot interferometric system for on-machine metrology

机译:用于机计量的双模快照干涉系统

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摘要

For the first time, we present a dual-mode snapshot interferometric system for measuring both surface shape and surface roughness to meet the need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and interference microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interfero-grams simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine. interferometry; surface measurements; roughness; interference microscope.
机译:我们首次出示双模快照干涉系统,用于测量表面形状和表面粗糙度,以满足光学制造中的机器计量的需求。使用Linnik配置实现了两种不同的模式,干涉仪模式和干扰显微镜模式。为了实现快照测量,使用像素化偏振光相机同时捕获四个相移干扰克。我们通过将其安装在钻石车削机上,展示了其对离线计量和机床计量的性能。干涉测量;表面测量;粗糙;干扰显微镜。

著录项

  • 来源
    《Optical engineering 》 |2019年第4期| 044104.1-044104.6| 共6页
  • 作者单位

    University of Arizona College of Optical Sciences Tucson Arizona United States;

    University of Arizona College of Optical Sciences Tucson Arizona United States Northeast Electric Power University Institute of Materials Physics College of Science Jilin China;

    Oculus VR LLC Seattle Washington United States;

    University of Arizona College of Optical Sciences Tucson Arizona United States;

    University of Arizona College of Optical Sciences Tucson Arizona United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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