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Research on optically controlled active surface filtering technology

机译:光控有源表面滤波技术研究

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摘要

In order to realize the application of active surface filtering technology in an optical window, an optically controlled active surface filtering technology is proposed. Photoelectrically conductive thin-film photovoltaic effect is used to control the dimensional change of the metal frequency-selective surface (FSS), thereby achieving active control of surface filtering. Starting from the theory, the principle of active surface filtering technology is described. CST software is used to simulate the FSS characteristics of two types of metal FSSs, "cross" bandpass type and "Jerusalem" band-stop type, under light irradiation conditions. The results show that the filter center frequency is changed from 23 and 13 GHz to 27.6 and 9.8 GHz, respectively, with the change of the structure size. In this experiment, the cross bandpass type and Jerusalem band-stop type optically controlled active FSS are, respectively, fabricated by coating, etching, and electron beam evaporation techniques. With annealing temperature of 750°C and the annealing time of 300 s, it gets the best optoelectronic performance. The experimental results are that the sensitive wavelength of photoconductive thin film is 0.6 //m and the optimal illumination power is 150 mW/cm2. The sample filter center frequency is changed from 23.8 and 13.5 GHz to 28 and 10.5 GHz, respectively, which is basically consistent with the simulation results. This paper concludes that the use of light control can realize active control of surface filtering.
机译:为了实现有源表面滤波技术在光学窗口中的应用,提出了一种光控有源表面滤波技术。光电导薄膜光电效应用于控制金属频率选择表面(FSS)的尺寸变化,从而实现对表面滤波的主动控制。从理论出发,描述了有源表面滤波技术的原理。 CST软件用于在光照条件下模拟两种类型的金属FSS(“交叉”带通类型和“耶路撒冷”带阻类型)的FSS特性。结果表明,随着结构尺寸的变化,滤波器的中心频率从23 GHz和13 GHz分别变为27.6和9.8 GHz。在该实验中,交叉带通型和耶路撒冷带阻型光控有源FSS是分别通过涂覆,蚀刻和电子束蒸发技术制造的。退火温度为750°C,退火时间为300 s,它具有最佳的光电性能。实验结果表明,光电导薄膜的敏感波长为0.6 // m,最佳照明功率为150 mW / cm2。采样滤波器的中心频率分别从23.8 GHz和13.5 GHz更改为28 GHz和10.5 GHz,这与仿真结果基本一致。本文的结论是,使用光控制可以实现对表面滤波的主动控制。

著录项

  • 来源
    《Optical engineering》 |2018年第7期|077105.1-077105.7|共7页
  • 作者单位

    Changchun University of Science and Technology, National Demonstration Center for Experimental Opto-Electronic Engineering Education, School of Opto-Electronic Engineering, Changchun, China;

    Changchun University of Science and Technology, National Demonstration Center for Experimental Opto-Electronic Engineering Education, School of Opto-Electronic Engineering, Changchun, China;

    Liaoshen Industrial Group Co., Ltd., Shenyang. China;

    Liaoshen Industrial Group Co., Ltd., Shenyang. China;

    Changchun University of Science and Technology, National Demonstration Center for Experimental Opto-Electronic Engineering Education, School of Opto-Electronic Engineering, Changchun, China;

    Changchun University of Science and Technology, National Demonstration Center for Experimental Opto-Electronic Engineering Education, School of Opto-Electronic Engineering, Changchun, China;

    Changchun University of Science and Technology, National Demonstration Center for Experimental Opto-Electronic Engineering Education, School of Opto-Electronic Engineering, Changchun, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    wavelength filtering devices; thin films; frequency filtering; photoconductive materials;

    机译:波长过滤装置;薄膜;频率滤波光电导材料;

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