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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Comparison of aqueous corrosion behavior of zirconium and zircaloy-4 implanted with molybdenum
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Comparison of aqueous corrosion behavior of zirconium and zircaloy-4 implanted with molybdenum

机译:锆和锆4注入钼的水腐蚀行为比较

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In order to study the effect of molybdenum ion implantation on the aqueous corrosion behavior of zirconium and zircaloy-4, specimens were implanted by molybdenum ions with a dose range from 1 x 10~(16) to 5 x 10~(17) ions/cm~2 at maximum 160 ℃, using MEVVA source at an extracted voltage of 40 kV. Auger electron spectroscopy and X-ray photoemission spectroscopy were employed to investigate the distribution and the valence of oxygen, zirconium and molybdenum ions inside the oxide films before and after implantation. Three-sweep potentiodynamic polarization measurement was employed to value the aqueous corrosion resistance of zirconium in a 1 N H_2SO_4 solution. Scanning electron microscopy was performed for the three-sweep potentiodynamic polarized samples. It was found that the aqueous corrosion resistance of zirconium implanted with molybdenum declined with the raising dose. The greater is the implantation dose, the bigger is the decline. And the natural corrosion potential of the implanted zirconium became more positive than as-received zirconium. While as for zircaloy-4, the corrosion resistance of samples implanted molybdenum ions will increase when the doses are less than 5 x 10~(16) ions/cm~2. Finally, the mechanisms of the corrosion behavior of the molybdenum-implanted zirconium and zircaloy-4 are discussed.
机译:为了研究钼离子注入对Zircaloy-4和Zircaloy-4的水腐蚀行为的影响,以1 x 10〜(16)至5 x 10〜(17)离子/剂量的钼离子注入标本。使用MEVVA源在40 kV的提取电压下,最高160℃cm〜2。利用俄歇电子能谱和X射线光电子能谱研究了注入前后氧化膜内部氧,锆和钼离子的分布和化合价。三扫电位极化测量用于评估锆在1 N H_2SO_4溶液中的耐水性腐蚀性能。扫描电子显微镜对三扫描电位动力学极化样品进行。发现随着钼剂量的增加,注入钼的锆的耐水腐蚀性能下降。植入剂量越大,下降幅度越大。而且,植入的锆的自然腐蚀势能比接受的锆更强。而对于Zircaloy-4,当剂量小于5 x 10〜(16)离子/ cm〜2时,植入钼离子的样品的耐蚀性将会提高。最后,讨论了钼注入的锆和锆合金4的腐蚀行为的机理。

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