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Phase transformation during silica cluster impact on crystal silicon substrate studied by molecular dynamics simulation

机译:分子动力学模拟研究二氧化硅团簇撞击晶体硅衬底时的相变

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摘要

The process of a silica cluster impact on a crystal silicon substrate is studied by molecular dynamics simulation. At the impact loading stage, crystal silicon of the impact zone transforms to a locally ordered molten with increasing the local temperature and pressure of the impact zone. And then the transient molten forms amorphous silicon directly as the local temperature and pressure decrease at the impact unloading stage. Moreover, the phase behavior between the locally ordered molten and amorphous silicon exhibits the reversible structural transition. The transient molten contains not only lots of four-fold atom but also many three- and five-fold atoms. And the five-fold atom is similar to the mixture structure of semi-Si-II and semi-bct5-Si. The structure transformation between five- and four-fold atoms is affected by both pressure and temperature. The structure transformation between three- and four-fold atoms is affected mostly by temperature. The direct structure transformation between five- and three-fold atoms is not observed. Finally, these five- and three-fold atoms are also different from the usual five- and three-fold deficient atoms of amorphous silicon. In addition, according to the change of coordination number of atoms the impact process is divided into six stages: elastic, plastic, hysteresis, phase regressive, adhesion and cooling stages.
机译:通过分子动力学模拟研究了二氧化硅团簇撞击晶体硅基板的过程。在冲击加载阶段,随着冲击区的局部温度和压力的增加,冲击区的晶体硅转变为局部有序的熔融液。然后,在冲击卸载阶段,随着局部温度和压力的降低,瞬态熔体直接形成非晶硅。而且,局部有序的熔融硅和非晶硅之间的相行为表现出可逆的结构转变。瞬态熔体不仅包含许多四倍原子,而且还包含许多三倍和五倍原子。并且五重原子类似于半-Si-II和半-bct5-Si的混合结构。五倍和四倍原子之间的结构转变受压力和温度的影响。三倍和四倍原子之间的结构转变主要受温度影响。没有观察到五倍和三倍原子之间的直接结构转变。最后,这些五倍和三倍原子也不同于通常的非晶硅的五倍和三倍缺陷原子。此外,根据原子配位数的变化,冲击过程分为六个阶段:弹性,塑性,滞后,相变,粘附和冷却阶段。

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