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Over saturation behavior of SiPMs at high photon exposure

机译:高光子暴露下SiPM的过饱和行为

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Several types of Silicon Photomultipliers were exposed to short pulsed laser light (~ 30 ps FWHM) with its intensity varying from single photon to well above the number of microcells of the device. We observed a significant deviation of the output of SiPMs from the expected behavior although such response curve is considered to be rather trivial. We also noticed that the output exceeds the maximum expected pulse height which should be defined as the total number of pixels times the single photon pulse height. At the highest light intensity (~ 500 times the number of pixels) that we tested, the signal output reached up to twice the maximum theoretical pulse height, and still did not fully saturate.
机译:几种类型的硅光电倍增管暴露于短脉冲激光(〜30 ps FWHM)下,其强度范围从单光子到远高于器件的微单元数量。尽管这种响应曲线被认为是微不足道的,但我们观察到了SiPMs的输出与预期行为的显着偏差。我们还注意到,输出超过最大预期脉冲高度,该最大预期脉冲高度应定义为像素总数乘以单个光子脉冲高度。在我们测试的最高光强度(约为像素数的500倍)下,信号输出达到最大理论脉冲高度的两倍,但仍未完全饱和。

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