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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment >High voltage stability and cleaning of 2 m~2 resistive strip micromegas detectors (SM2) for the upgrade of the forward muon spectrometer of the ATLAS experiment
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High voltage stability and cleaning of 2 m~2 resistive strip micromegas detectors (SM2) for the upgrade of the forward muon spectrometer of the ATLAS experiment

机译:高压稳定性和2 m〜2电阻条微兆检波器(SM2)的清洁,用于升级ATLAS实验的正向μ子光谱仪

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摘要

For the upgrade of the innermost station of the forward muon spectrometer of the ATLAS experiment large Micromegas (MM) detectors of 2 and 3 m(2) with 4 active layers each are foreseen. Four types of MM chambers are produced among four sites. Each sites has to deliver 32 quadruplets or 128 active planes. The tiny 120 mu m distance between the 600 V resistive strip anodes and the ground micro-meshes for these large areas require adequate and well adapted cleaning procedures to guarantee high voltage stability. This is particularly critical for strip shaped surfaces made from resistive material where remnants from the lithographic production processes must be completely removed. The procedure foreseen a visual inspections to be carried on during cleaning and assembly procedures; a wet cleaning procedure to remove dust and possible ionic components of salts from the anode surfaces; a dry cleaning procedure to remove dust; HV tests to be done to validate the cleaning. The cleaning procedure will be illustrated for a New Small Wheel (NSW) Outer Small Module (SM2) of 2 m(2).
机译:为了升级ATLAS实验正向介子光谱仪的最内层站,可以预见2到3 m(2)的大型Micromega(MM)探测器,每个探测器有4个有源层。在四个位置之间产生四种类型的MM腔室。每个站点必须交付32个四联体或128个活动平面。在这些大面积的区域中,600 V电阻式条形阳极与接地微网之间的120μm微小距离需要适当且适应性强的清洁程序,以确保高电压稳定性。这对于由电阻材料制成的条形表面尤为重要,在该表面上必须完全去除光刻生产过程中的残留物。该程序预见了在清洁和组装过程中要进行的目视检查;湿法清洁程序,以去除阳极表面的灰尘和盐中可能的离子成分;干洗程序以去除灰尘;要进行HV测试以验证清洁效果。将说明2 m(2)的新小轮(NSW)外部小模块(SM2)的清洁程序。

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