Stability analysis of the vertical position control loop in TCV using rigid and deformable plasma models

摘要

The stability of the vertical position control system in TCV is analysed using two different plasma models, a deformable plasma model(DPM)and a rigid plasma model(RPM). The open loop growth rates and closed loop stability are computed, as functions of various plasma param- eters, for both models. It is found that the difference between the open loop growth rates predicted by the two models depends significantly on plasma elongation and triangularity. Growth rates are also computed using the NOVA-W code, and good agreement is found with the DPM results.