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Evaluation of silicon carbide as a divertor armor material in DIII-D H-mode discharges

机译:DIII-D H模式放电中的碳化硅作为偏转器铠装材料的评估

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摘要

Silicon carbide (SiC) represents a promising but largely untested plasma-facing material (PFM) for next-step fusion devices. In this work, an analytic mixed-material erosion model is developed by calculating the physical (via SDTrimSP) and chemical (via empirical scalings) sputtering yield from SiC, Si, and C. The Si content in the near-surface SiC layer is predicted to increase during D plasma bombardment due to more efficient physical and chemical sputtering of C relative to Si. Silicon erosion from SiC thereby occurs primarily from sputtering of the enriched Si layer, rather than directly from the SiC itself. SiC coatings on ATJ graphite, manufactured via chemical vapor deposition, were exposed to repeated H-mode plasma discharges in the DIII-D tokamak to test this model. The qualitative trends from analytic modeling are reproduced by the experimental measurements, obtained via spectroscopic inference using the S/XB method. Quantitatively the model slightly under-predicts measured erosion rates, which is attributed to uncertainties in the ion impact angle distribution, as well as the effect of edge-localized modes. After exposure, minimal changes to the macroscopic or microscopic surface morphology of the SiC coatings were observed. Compositional analysis reveals Si enrichment of about 10%, in line with expectations from the erosion model. Extrapolating to a DEMO-type device, an order-of-magnitude decrease in impurity sourcing, and up to a factor of 2 decrease in impurity radiation, is expected with SiC walls, relative to graphite, if low C plasma impurity content can be achieved. These favorable erosion properties motivate further investigations of SiC as a low-Z, non-metallic PFM.
机译:碳化硅(SiC)代表了一个有望但主要是未测试的面向等离子体的材料(PFM),用于下一步融合装置。在这项工作中,通过从SiC,Si和C的溅射产量计算物理(通过SDTRIMSP)和化学(通过经验缩放)溅射产量来开发分析混合材料腐蚀模型。预测近表面SiC层中的Si含量由于C相对于Si的更有效的物理和化学溅射,在d等离子体轰击期间增加。来自SiC的硅腐蚀,从而主要发生富集的Si层的溅射,而不是直接来自SiC本身。通过化学气相沉积制造的ATJ石墨上的SiC涂层暴露于DIII-D Tokamak中的重复的H模式等离子体放电以测试该模型。通过使用S / XB方法通过光谱推理获得的实验测量来再现分析建模的定性趋势。定量地,模型略微预测测量的侵蚀速率,其归因于离子冲击角分布中的不确定性,以及边缘局部模式的效果。接触后,观察到SiC涂层的宏观或微观表面形态的最小变化。组成分析显示Si富集约10%,符合来自侵蚀模型的期望。外推到演示型器件,杂质采集的数量级降低,并且杂质辐射的降低至2倍,如果可以实现低C等离子体杂质含量,则使用SiC壁对SiC壁进行杂质辐射的减少。这些有利的侵蚀性能激发SiC作为低Z,非金属PFM的进一步研究。

著录项

  • 来源
    《Nuclear fusion》 |2021年第6期|066005.1-066005.16|共16页
  • 作者单位

    General Atomics San Diego CA 92121 United States of America;

    General Atomics San Diego CA 92121 United States of America;

    General Atomics San Diego CA 92121 United States of America;

    General Atomics San Diego CA 92121 United States of America;

    General Atomics San Diego CA 92121 United States of America;

    General Atomics San Diego CA 92121 United States of America;

    University of California San Diego La Jolla CA 92093 United States of America;

    Oak Ridge National Laboratory Oak Ridge TN 37831 United States of America;

    Oak Ridge National Laboratory Oak Ridge TN 37831 United States of America;

    Lawrence Livermore National Laboratory Livermore CA 94550 United States of America;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    DIII-D; silicon carbide; SiC; sputtering; erosion; plasma-materials interactions; divertor;

    机译:DIII-D;碳化硅;SIC;溅射;侵蚀;等离子体材料相互作用;隅兽者;

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