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Effect of net direct current on the properties of radio frequency sheaths: simulation and cross-code comparison

机译:净直流对射频护套性能的影响:仿真与交叉码比较

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摘要

In order to understand, predict and control ion cyclotron range of frequency interactions with tokamak scrape-off layer plasmas, computational tools which can model radio frequency (RF) sheaths are needed. In particular, models for the effective surface impedance and DC rectified sheath potentials may be coupled with full wave RF simulation codes to predict self-consistent wave fields near surfaces and the resulting power dissipation and plasma-material interactions from ion sputtering. In this study, previous work assuming zero net DC current flow through the sheath is generalized to allow the surface to collect net positive or negative current, as is often observed in experiments. The waveforms, DC potential and RF admittance are investigated by means of analytical theory, nonlinear fluid and particle-in-cell codes. Cross-code comparisons provide detailed model verification and elucidate the roles of ion and electron kinetics. When the sheath draws negative (positive) DC current, the voltage rectification is reduced (increased) compared with the zero-current case, and the magnitude of both the real and imaginary parts of the admittance are increased (reduced). A previous four-input parametrization of the sheath rectification and admittance properties is generalized to include a fifth parameter describing the DC sheath current.
机译:为了理解,预测和控制与Tokamak刮擦层等离子体的频率相互作用的离子回旋速度,需要计算射频(RF)护套的计算工具。特别地,用于有效表面阻抗和DC整流鞘电位的模型可以与全波RF仿真码耦合,以预测表面附近的自一致波场以及来自离子溅射的所得的功率耗散和等离子体材料相互作用。在该研究中,假设零净直流电流通过护套的先前工作是推广的,以允许表面收集净正或负电流,如在实验中经常观察到的那样。通过分析理论,非线性流体和粒细胞码来研究波形,直流电位和RF导纳。交叉码比较提供了详细的模型验证并阐明了离子和电子动力学的作用。当护套绘制负(正)DC电流时,与零电流情况相比,电压整流减小(增加),并且导纳的真实和虚部的大小增加(减少)。鞘整流和导纳特性的先前四输入参数化是推广的,以包括描述DC鞘电流的第五参数。

著录项

  • 来源
    《Nuclear fusion》 |2021年第1期|016030.1-016030.14|共14页
  • 作者单位

    Lodestar Research Corporation 2400 Central Ave. Suite P-5 Boulder CO 80301 United States of America;

    University of Illinois at Urbana-Champaign 104 S. Wright St Urbana IL 61821 United States of America;

    University of Illinois at Urbana-Champaign 104 S. Wright St Urbana IL 61821 United States of America;

    Tech-X Corporation 5621 Arapahoe Avenue Suite A Boulder CO 80303 United States of America;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ICRF; sheath; simulation; impedance; rectification; tokamak;

    机译:ICRF;鞘;模拟;阻抗;整改;托卡马克;

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