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Detecting excitation and magnetization of individual dopants in a semiconductor

机译:检测半导体中单个掺杂物的激发和磁化

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摘要

An individual magnetic atom doped into a semiconductor is a promising building block for bottom-up spintronic devices and quantum logic gates. Moreover, it provides a perfect model system for the atomic-scale investigation of fundamental effects such as magnetism in dilute magnetic semiconductors. However, dopants in semiconductors so far have not been studied by magnetically sensitive techniques with atomic resolution that correlate the atomic structure with the dopant's magnetism. Here we show electrical excitation and read-out of a spin associated with a single magnetic dopant in a semiconductor host. We use spin-resolved scanning tunnelling spectroscopy to measure the spin excitations and the magnetization curve of individual iron surface-dopants embedded within a two-dimensional electron gas confined to an indium anti-monide (110) surface. The dopants act like isolated quantum spins the states of which are governed by a substantial magnetic anisotropy that forces the spin to lie in the surface plane. This result is corroborated by our first principles calculations. The demonstrated methodology opens new routes for the investigation of sample systems that are more widely studied in the field of spintronics-that is, Mn in GaAs (ref. 5), magnetic ions in semiconductor quantum dots, nitrogen-vacancy centres in diamond and phosphorus spins in silicon.
机译:掺杂到半导体中的单个磁性原子是自底向上自旋电子器件和量子逻辑门的有前途的构建基块。此外,它为原子尺度研究基本效应(例如稀磁半导体中的磁性)提供了理想的模型系统。然而,迄今为止,尚未通过具有原子分辨率的磁敏感技术研究半导体中的掺杂剂,该技术使原子结构与掺杂剂的磁性相关联。在这里,我们显示了与半导体主机中的单个磁性掺杂物相关的自旋的电激发和读出。我们使用自旋分辨扫描隧道光谱法来测量嵌入在局限于锑化铟(110)表面的二维电子气中的各个铁表面掺杂物的自旋激发和磁化曲线。掺杂剂的作用就像孤立的量子自旋,其状态由相当大的磁各向异性控制,该各向异性迫使自旋位于表面平面中。我们的第一个原理计算结果证实了这一结果。证明的方法论为自旋电子学领域中被广泛研究的样品系统的研究开辟了新途径,即Ga​​As中的Mn(参考文献5),半导体量子点中的磁离子,金刚石和磷中的氮空位中心在硅中旋转。

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  • 来源
    《Nature》 |2010年第7319期|p.1084-1087|共4页
  • 作者单位

    Institute of Applied Physics, Hamburg University, Jungiusstrasse 11, D-20355 Hamburg, Germany;

    rnInstitute of Applied Physics, Hamburg University, Jungiusstrasse 11, D-20355 Hamburg, Germany;

    rnInstitute of Applied Physics, Hamburg University, Jungiusstrasse 11, D-20355 Hamburg, Germany;

    rnInstitute for Theoretical Physics, Hamburg University, Jungiusstrasse 9, D-20355 Hamburg, Germany;

    rnInstitute for Theoretical Physics, Hamburg University, Jungiusstrasse 9, D-20355 Hamburg, Germany;

    rnInstitute of Applied Physics, Hamburg University, Jungiusstrasse 11, D-20355 Hamburg, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 02:55:16

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