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首页> 外文期刊>Microwaves, Antennas & Propagation, IET >X-band, high performance, SiGe-heterojunction bipolar transistors-low noise amplifier for phased array radar applications
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X-band, high performance, SiGe-heterojunction bipolar transistors-low noise amplifier for phased array radar applications

机译:X波段高性能SiGe异质结双极晶体管低噪声放大器,用于相控阵雷达应用

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摘要

This study presents an X-band low noise amplifier (LNA) implemented in 0.25 ;C;m SiGe BiCMOS process aiming for phased array radar applications. The LNA is composed of two cascode stages using SiGe heterojunction bipolar transistors to achieve low noise figure, high gain and a better matching to 50 :9; at the input and output, simultaneously. The first stage is designed for low noise performance whereas the second stage is optimised to improve the input third-order intercept point (IIP3). The LNA resulted in a measured gain of 21 dB, a noise figure of 1.52 dB and an IIP3 of -8 dBm at 10 GHz. The active chip area without pads is 620 ?? 820 ;C;2 and the power dissipation is 22 mW from a 2.2 V power supply. These performance parameters collectively constitute the best figure-of-merit value of 101, reported in similar technologies.
机译:这项研究提出了一种以0.25; C; m SiGe BiCMOS工艺实现的X波段低噪声放大器(LNA),旨在用于相控阵雷达应用。 LNA由两个共源共栅级组成,使用SiGe异质结双极晶体管实现低噪声系数,高增益和更好的50:9匹配度。同时在输入和输出。第一级设计用于低噪声性能,而第二级则经过优化以改善输入三阶交调点(IIP3)。 LNA在10 GHz时测得的增益为21 dB,噪声系数为1.52 dB,IIP3为-8 dBm。不带焊盘的有源芯片面积为620 ?? 820; C; 2 ,使用2.2 V电源的功耗为22 mW。这些性能参数共同构成了类似技术中报告的最佳品质因数101。

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