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Oxide Scales Formed on NiTi and NiPtTi Shape Memory Alloys

机译:NiTi和NiPtTi形状记忆合金上形成的氧化皮

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Ni-49Ti and Ni-30Pt-50Ti (nominal at. pct) shape memory alloys (SMAs) were isothermally oxidized in air over the temperature range of 773 K to 1173 K (500 °C to 900 °C) for 100 hours. The oxidation kinetics, presented in detail in a companion study, show ~4 times reduction in oxidation rate due to Pt.[1] The microstructure, composition, and phase content of the scales and depletion zones were determined by scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), and X-ray diffraction (XRD). A relatively pure TiO2 rutile structure was identified as the predominant scale surface feature, typified by a distinct highly striated and faceted crystal morphology, with crystal size proportional to oxidation temperature. The complex layered structure beneath these crystals was characterized by semiquantitative XRD of serial/taper polished sections and SEM/EDS of cross sections for samples oxidized at 973 K (700 °C). In general, graded mixtures of TiO2, NiTiO3, NiO, Ni(Ti), or Pt(Ni) metallic dispersoids, and continuous Ni3Ti or Pt-rich metal depletion zones, were observed from the gas surface to the substrate interior. Overall, substantial depletion of Ti occurred due to the formation of predominantly TiO2 scales. It is proposed that the Ni-30Pt-50Ti alloy oxidized more slowly than the binary Ni-49Ti alloy by decreasing oxygen and titanium diffusion through the thin Pt-rich layer.
机译:将Ni-49Ti和Ni-30Pt-50Ti(标称at。pct)形状记忆合金(SMAs)在空气中在773 K至1173 K(500°C至900°C)的温度范围内等温氧化100小时。在伴随研究中详细介绍的氧化动力学显示,由于Pt,氧化速率降低了约4倍。[1]通过扫描电子显微镜(SEM),能量色散谱(EDS)和X射线衍射(XRD)确定水垢和耗尽区的微观结构,组成和相含量。 TiO2 金红石结构相对纯净,被认为是主要的鳞片表面特征,其特征是具有明显的高度横纹和多面的晶体形态,晶体尺寸与氧化温度成正比。这些晶体下面的复杂层状结构的特征是,对在973 K(700°C)氧化的样品进行了连续/锥形抛光截面的半定量XRD和截面的SEM / EDS。通常,TiO2 ,NiTiO3 ,NiO,Ni(Ti)或Pt(Ni)金属弥散体与连续的Ni3 Ti或Pt富金属耗尽区的梯度混合物为从气体表面到基材内部观察。总体而言,由于主要是TiO2氧化皮的形成,导致Ti的大量消耗。提出通过减少氧气和钛在富Pt薄层中的扩散,Ni-30Pt-50Ti合金的氧化比二元Ni-49Ti合金的氧化更慢。

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