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首页> 外文期刊>Mechanics of materials >Nanoscale amorphization effect on dislocation emission from an elliptical blunt crack tip in deformed nanocrystalline and ultrafine-grained materials
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Nanoscale amorphization effect on dislocation emission from an elliptical blunt crack tip in deformed nanocrystalline and ultrafine-grained materials

机译:纳米非晶化对变形纳米晶和超细材料中椭圆钝裂纹尖端的位错发射的影响

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摘要

A theoretical model is established to describe the effect of nanoscale amorphization on the lattice dislocation emission from an elliptical blunt crack tip in deformed nanocrystalline and ultrafine-grained materials. Within the description, the nanoscale amorphization occurs through the splitting transformation of grain boundary disclinations which are produced by grain boundary sliding. The criterion for the first dislocation emission form the elliptical blunt crack is derived. The influence of the nanoscale amorphization and the features of the elliptical blunt crack on the critical stress intensity factors for the dislocation emission are discussed in detail. The obtained results show that the nanoscale amorphization can either enhance or weaken the critical applied SIFs for dislocation emission, depending on the emission angle, the radius of curvature of the elliptical blunt crack and the distance between the nanoscale amorphization and the crack tip. There is a critical crack junction distance making the dislocation emission most difficult and at this critical crack-junction distance, the stress release effect of the nanoscale amorphization is strongest.
机译:建立了理论模型来描述纳米级非晶化对变形纳米晶和超细颗粒材料中椭圆钝裂纹尖端晶格位错发射的影响。在说明书中,纳米级非晶化是通过由晶界滑动产生的晶界错位的分裂转变而发生的。推导了椭圆钝裂纹第一次位错发射的判据。详细讨论了纳米级非晶化和椭圆钝裂纹特征对位错发射临界应力强度因子的影响。所得结果表明,纳米级非晶化可以增强或减弱位错发射的关键应用SIF,具体取决于发射角,椭圆钝裂纹的曲率半径以及纳米级非晶化与裂纹尖端之间的距离。存在一个临界裂纹结距离,使得位错发射最困难,并且在该临界裂纹结距离处,纳米级非晶化的应力释放效果最强。

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