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Comprehensive investigations on the influence of gun current of plasma spraying on the properties of silicon carbide films

机译:等离子喷涂枪电流对碳化硅膜性能影响的综合研究

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Polycrystalline silicon carbide films have been prepared by the gas tunnel type plasma spraying method (GTPS). The effect of gun current on microstructure and mechanical properties was investigated. Scanning electron microscopy, X-ray diffraction, energy dispersive spectroscopy, nanoindentation and abrasive wear were used to characterize the structure, thickness, composition and the mechanical properties of SiC films. Microstructural studies revealed that the formation of cubic silicon carbide (C-SiC) at higher gun currents from 120 to 140 A. The SiC films have good-adhesion, dense, smooth and compact morphology. Hardness of SiC films strongly improved from 23 to 31.5 GPa as the gun current increased from 0 to 140 A. SiC films formed at higher gun current exhibits better wear resistance than that deposited at low gun current, mainly due to SiC films become more hard and more dense. The crystalline cubic silicon carbide films with good morphology and mechanical properties have been obtained from the GTPS method, which makes it a suitable material for high-temperature thermoelectric and mechanical applications.
机译:已经通过气体隧道型等离子体喷涂法(GTPS)制备了多晶碳化硅膜。研究了喷枪电流对显微组织和力学性能的影响。扫描电子显微镜,X射线衍射,能量色散光谱,纳米压痕和磨料磨损被用来表征SiC膜的结构,厚度,组成和机械性能。微观结构研究表明,在120至140 A的较高喷枪电流下会形成立方碳化硅(C-SiC)。SiC膜具有良好的粘附性,致密,光滑和致密的形态。随着喷枪电流从0增加到140 A,SiC膜的硬度从23 GPa显着提高到31.5 GPa。在较高喷枪电流下形成的SiC膜比在低喷枪电流下沉积的SiC膜具有更好的耐磨性,这主要是由于SiC膜变得更硬和更密。通过GTPS方法获得了具有良好形貌和机械性能的结晶立方碳化硅膜,这使其成为高温热电和机械应用的合适材料。

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