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Cyclic deformation of silicon single crystals: mechanical behaviour and dislocation arrangements

机译:硅单晶的循环变形:机械行为和位错排列

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摘要

Fatigue testing of single crystalline Si was performed in a temperature and strain rate domain where lattice friction is still effective: 1073-1173 K and 3 x 10~(-4) s~(-1). Tension-compression loading was applied to samples oriented for single slip under plastic strain amplitude control. For plastic strain amplitudes ranging from 6 x 10~(-4) to 10~(-2), cyclic stress-strain curves exhibit two different stages of hardening and pass through a maximum before saturation is reached. At variance from what is observed in fcc metals, the maximum and saturation stresses decrease when the strain amplitude per cycle is increased. Surface observations suggest that strain localisation takes place near the maximum cyclic stress and beyond. TEM observations revealed several kinds of typical dislocation arrangements, which are rather different from those observed in copper. Before the maximum stress, thick rectilinear walls made of edge dislocation dipoles are the main feature. When observed perpendicularly, those walls form more or less corrugated arrangements. After the maximum stress has been reached, plastic strain seems to concentrate in much thinner walls, while in inactive areas, the dislocation structure anneals, converting the dipolar walls in rows of prismatic loops. Active areas are much broader than the persistent slip bands with the well-known ladder structure that are observed in copper.
机译:在温度和应变率范围内对单晶硅进行疲劳测试,其中晶格摩擦仍然有效:1073-1173 K和3 x 10〜(-4)s〜(-1)。在塑性应变幅度控制下,将拉伸压缩载荷施加到定向为单次滑动的样品上。对于范围从6 x 10〜(-4)到10〜(-2)的塑性应变,循环应力-应变曲线表现出两个不同的硬化阶段,并在达到饱和之前通过最大值。与fcc金属中观察到的变化不同,当每个周期的应变幅度增加时,最大应力和饱和应力会减小。表面观察表明,应变局部化发生在最大循环应力附近或更高。 TEM观察揭示了几种典型的位错排列,与铜中观察到的排列有很大不同。在最大应力之前,由边缘错位偶极子制成的厚直线壁是主要特征。当垂直观察时,那些壁或多或少地形成波纹状布置。达到最大应力后,塑性应变似乎集中在薄得多的壁上,而在非活动区域,位错结构退火,将偶极壁转变成棱柱形环。活动区域比在铜中观察到的具有众所周知的梯形结构的持久滑带要宽得多。

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