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Microstructure and tensile deformation of nanocrystalline Cu produced by pulse electrodeposition

机译:脉冲电沉积法制备纳米晶铜的组织和拉伸变形

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摘要

Bulk nanocrystalline Cu with an average grain size of 33 nm, a strong {200} texture and a narrow grain size distribution was produced by pulse electrodeposition. Tensile tests on this material indicated a combination of high yield strength (624 MPa), limited tensile elongation (<5%)and enhanced strain rate sensitivity (0.029). Deformation mechanisms were discussed with strain rate sensitivity and activation volume under analytical models from the literature. Overall, the plastic deformation of the nanocrystalline Cu was dominated by dislocation processes, while grain boundary activities were also involved especially at the lowest strain rate. Analysis on the fracture surfaces revealed a brittle feature.
机译:通过脉冲电沉积产生具有33nm的平均晶粒尺寸,强的{200}织构和窄的晶粒尺寸分布的块状纳米晶体Cu。在这种材料上的拉伸测试表明,高屈服强度(624 MPa),有限的拉伸伸长率(<5%)和增强的应变速率敏感性(0.029)相结合。在文献的分析模型下,利用应变速率敏感性和活化体积讨论了变形机理。总体而言,纳米晶Cu的塑性变形主要由位错过程控制,而晶界活性也参与其中,特别是在最低应变速率下。断裂表面的分析显示出脆性特征。

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