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Glass formation and local arrangement of chalcogenide of Ga_(40)Se_(60) and Ga_(33)Se_(60)Te_7

机译:Ga_(40)Se_(60)和Ga_(33)Se_(60)Te_7的硫族化物的玻璃形成和局部排列

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摘要

The Ga_(40-x)Se_(60)Te_x with x = 0.0 and 7 alloys were prepared by quenching technique. The glass transition, crystallization, and melting temperature was determined by differential scanning calorimetry (DSC). The activation energy was calculated for both glass transition temperature and crystallization temperature (E_t and E_c). Thin films were deposited by a thermal evaporation technique with thickness range (30-170) nm. The amorphization could be confirmed by X-ray diffraction and scanning electron microscope (SEM) and the effect of composition and thickness of thin films on the optical band gap values. The mechanism of the optical absorption follows the rule of indirect allowed transition. The energy gap (E_g) increases with increasing thickness, but decreases by adding Te in Ga_(40)Se_(60). Optical constants measurement such as (refractive index n, the absorption index K and dispersion parameter) has been obtained for films with thickness (170 nm). The real part and imaginary part of dielectric constant are determined. The temperature dependence of conductivity was studied as a function of composition and thickness in the temperature range 288-328 K. It is noticed that activation energy increases as film thickness increases. The obtained results were treated in the frame of chemical bond approach proposed by Blcerano and Ovshinsky [J. Non-Cryst. Solids 74 (1985)] and average coordination number .
机译:x = 0.0的Ga_(40-x)Se_(60)Te_x和7合金通过淬火技术制备。通过差示扫描量热法(DSC)确定玻璃化转变,结晶和熔融温度。计算出玻璃化转变温度和结晶温度(E_t和E_c)的活化能。通过热蒸发技术沉积厚度范围为(30-170)nm的薄膜。非晶化可以通过X射线衍射和扫描电子显微镜(SEM)以及薄膜的组成和厚度对光学带隙值的影响来证实。光吸收的机理遵循间接允许跃迁的规则。能隙(E_g)随着厚度增​​加而增加,但是通过在Ga_(40)Se_(60)中添加Te而减小。对于厚度为(170 nm)的薄膜,已经获得了光学常数测量值,例如(折射率n,吸收系数K和色散参数)。确定介电常数的实部和虚部。研究了在288-328 K的温度范围内,电导率的温度依赖性与组成和厚度的关系。随着膜厚的增加,活化能也随之增加。所获得的结果在Blcerano和Ovshinsky提出的化学键方法的框架中进行了处理[J.非Cryst。 [Solid 74(1985)]和平均配位数

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