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机译:Ti / Al复合板钛层的低温等离子体氮化
Key Laboratory of Electromagnetic Processing of Materials, Ministry of Education, Northeastern University, Shenyang 110819, China;
Key Laboratory of Electromagnetic Processing of Materials, Ministry of Education, Northeastern University, Shenyang 110819, China;
Key Laboratory of Electromagnetic Processing of Materials, Ministry of Education, Northeastern University, Shenyang 110819, China;
Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China;
Titanium/aluminum clad sheet; Surface mechanical attrition treatment; Plasma nitriding; Wear resistance; Corrosion;
机译:钛等离子渗氮过程中a-Ti和δ(TiN)层形成的特殊性-低温区δ层生长的临界温度的理论估计-
机译:在低温等离子体氮化过程中塑造钛和Ti6Al7NB钛合金的结构和性能
机译:使用金属有机前体(C_(12)H_(23)N_3TI)和N_2等离子体的远程等离子体增强氮化钛膜的原子层沉积
机译:钛合金Ti-6Al-4V在低温离子渗氮下的结构相变
机译:用于直接板衬和铜扩散阻挡层应用的钌-氮化钛混合相层的等离子体增强原子层沉积。
机译:低温原子层沉积在氮化钛电极上的氧化物使电气细胞的培养和生理学记录能够
机译:钛等离子渗氮过程中α-Ti和δ(TiN)层形成的特殊性:低温区δ层生长的临界温度的理论估计(物理,过程,仪器和测量)