Negative-type photolithography of functionalized gold nanoparticles

Jun-Ho Lee; Soo-Jung Kang; Pyoung-Chan Lee; Tae Hoon Han; Jae-Do Nam; Youngkwan Lee

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Negative-type photolithography of functionalized gold nanoparticles

机译：功能化金纳米粒子的负型光刻

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Thiol-stabilized gold nanoparticles ranging in size from 2 to 13 nm were synthesized using a two-phase reduction method. The thiol-stabilized gold nanoparticles formed micropatterns on a glass substrate through UV irradiation and chemical oxidation. Overall, the micro-pattern obtained through this simple procedure has great potential in the electronics industry.

机译：使用两阶段还原法合成了2至13 nm的巯基稳定金纳米颗粒。硫醇稳定的金纳米颗粒通过紫外线照射和化学氧化在玻璃基板上形成微图案。总体而言，通过此简单过程获得的微图案在电子行业具有巨大的潜力。

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《Macromolecular Research》 |2009年第2期|137-139|共3页
作者
Jun-Ho Lee; Soo-Jung Kang; Pyoung-Chan Lee; Tae Hoon Han; Jae-Do Nam; Youngkwan Lee;
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Polymer Technology Institute Department of Polymer Science and Engineering Sungkyunkwan Univeristy 440-746 Suwon Korea;

Polymer Technology Institute Department of Polymer Science and Engineering Sungkyunkwan Univeristy 440-746 Suwon Korea;

Polymer Technology Institute Department of Polymer Science and Engineering Sungkyunkwan Univeristy 440-746 Suwon Korea;

Polymer Technology Institute Department of Polymer Science and Engineering Sungkyunkwan Univeristy 440-746 Suwon Korea;

Polymer Technology Institute Department of Polymer Science and Engineering Sungkyunkwan Univeristy 440-746 Suwon Korea;

Department of Chemical Engineering Sungkyunkwan Univeristy 440-746 Suwon Korea;

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Negative-type photolithography of functionalized gold nanoparticles

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