X-ray photoelectron spectroscopic study of poly[4,4′-iso-propylidenebis(1,4-phenyleneoxyethylene) diacrylate] photocured in the presence of a fluorine containing monomer

摘要

A preliminary X-ray photoelectron spectroscopic (XPS) investigation on poly[4,4′-iso-propylidenebis(1,4-phenyleneoxyethylene) diacrylate] samples obtained by photocuring on several substrates in the presence of a fluorine containing acrylic monomer is reported. Quantitative calculations based on F_(1s)/C_(1s) area ratios and C_(1s) peak fitting show a noticeable fluorine surface enrichment that ranges, depending on the substrate, from 17 wt.-% to 59 wt.-% of fluorine containing moiety. The calculations also reveal the presence of a concentration gradient at the surface.