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Luminous intensity correction method for misalignment-induced measurement error of light-emitting diode arrays

机译:发光二极管阵列失准引起的测量误差的发光强度校正方法

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摘要

To eliminate axial misalignment-induced measurement errors of discrete lightemitting diode arrays in the far-field condition, a robust and effective method for correcting the measured luminous intensity distribution is proposed. The precision of the correction can be determined beforehand by setting a criterion which can also be used to determine the required test distance. To validate the feasibility and practicability of the proposed approach, numerical simulations of light-emitting diode arrays with three kinds of typical luminous intensity distributions were performed. In addition, the test distances as a function of the light-emitting diode luminous intensity distribution, packing density and dimensions under translational misalignment were analysed. Some beneficial operating methods and rules for practical application are summarised. Finally, physical measurements of several experimental examples were collected. The correction results agreed with the desired data and again proved the utility of the presented method.
机译:为了消除在远场条件下离散的发光二极管阵列的轴向未对准引起的测量误差,提出了一种鲁棒而有效的校正所测量的发光强度分布的方法。可以通过设置标准来预先确定校正的精度,该标准也可以用于确定所需的测试距离。为了验证该方法的可行性和实用性,对三种典型发光强度分布的发光二极管阵列进行了数值模拟。此外,分析了在平移未对准条件下测试距离与发光二极管发光强度分布,堆积密度和尺寸的关系。总结了一些实用的操作方法和规则。最后,收集了几个实验示例的物理测量结果。校正结果与所需数据吻合,再次证明了该方法的实用性。

著录项

  • 来源
    《Lighting Research & Technology》 |2019年第3期|432-446|共15页
  • 作者

    HY Wu; HB Cheng; YP Feng; X Chen;

  • 作者单位

    Joint Research Center for Optomechatronics Engineering, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China,Shenzhen Research Institute, Beijing Institute of Technology, Shenzhen, China;

    Joint Research Center for Optomechatronics Engineering, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China,Shenzhen Research Institute, Beijing Institute of Technology, Shenzhen, China;

    Joint Research Center for Optomechatronics Engineering, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China,Shenzhen Research Institute, Beijing Institute of Technology, Shenzhen, China;

    Joint Research Center for Optomechatronics Engineering, School of Optics and Photonics, Beijing Institute of Technology, Beijing, China,Shenzhen Research Institute, Beijing Institute of Technology, Shenzhen, China;

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