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首页> 外文期刊>Key Engineering Materials >Influence of Firing Temperature on the Microstructure and Electrical Properties of BTZ Based Dielectric Material for Ni-MLCC
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Influence of Firing Temperature on the Microstructure and Electrical Properties of BTZ Based Dielectric Material for Ni-MLCC

机译:烧成温度对Ni-MLCC BTZ基介电材料微观结构和电性能的影响

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摘要

The influence of the microstructure on the redox behavior in barium zirconium titanate (BTZ)- based materials was investigated. The mean grain size was the largest for the chip fired at l230 deg.C, in Which there was only one grain per layer between Ni internal electrodes. A comparison of the temperature characteristics of the dielectric constant (8) between the chips fired in a reducing atmosphere (as-reduced sample) and those treated in a weakly oxidizing atmosphere revealed that the degree of ε increase was constant after the reoxidation treatment. The dependence of ε on the direct current bias field was larger for the as-reoxed sample than for the as- reduced one. On examination of the frequency response at the elevated temperature, the as-reduced samples showed two dielectric relaxations while the as-reoxed samples showed only one relaxation, irrespective of the firing temperature.
机译:研究了微观结构对钛酸钡锆(BTZ)基材料中氧化还原行为的影响。在1230℃下烧制的芯片的平均晶粒尺寸最大,其中Ni内部电极之间每层只有一个晶粒。在还原气氛中焙烧的芯片(还原后的样品)与在弱氧化气氛中处理的芯片之间的介电常数(8)的温度特性的比较表明,在再氧化处理之后,ε的增加程度是恒定的。氧化还原样品的ε对直流偏置场的依赖性大于还原样品。在高温下检查频率响应时,还原态的样品表现出两种介电弛豫,而氧化态的样品表现出一种介电弛豫,而与烧结温度无关。

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