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首页> 外文期刊>Key Engineering Materials >Voltage Transient Response of a ZnO-Based Multi-Layered Chip Varistor Doped with Alum (AIK(SO_4)_2·12H_2O)
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Voltage Transient Response of a ZnO-Based Multi-Layered Chip Varistor Doped with Alum (AIK(SO_4)_2·12H_2O)

机译:掺杂明矾(AIK(SO_4)_2·12H_2O)的ZnO基多层片式压敏电阻的电压瞬态响应

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摘要

ZnO-based multi-layered varistor (MLV) added with 0.01 wt/100 alum (AlK(SO_4)_2·12H_2O) as aqueous solution was fabricated by tape-casting and cofiring with Ag-Pd(7:3) inner electrode, with which the effect of alum addition on the varistor characteristics has been studied as a function of firing condition. Throughout the firing temperature range of 950~1100℃, considerable increases in both nonlinear coefficient (α) and the peak current (I_p) have been observed along with lowered voltage clamping ratio (C_R) of~1.5 compared with those in pure MLV. Moreover, the degradation of the leakage current (I_L) under the electrical stress was fairly improved in alum-added MLV fired at 1000~1050℃.
机译:通过流延浇铸并与Ag-Pd(7:3)内电极共烧制得添加有0.01 wt / 100明矾(AlK(SO_4)_2·12H_2O)作为水溶液的ZnO基多层压敏电阻(MLV)。研究了明矾添加对压敏电阻特性的影响,它是烧成条件的函数。与纯MLV相比,在950〜1100℃的整个烧成温度范围内,非线性系数(α)和峰值电流(I_p)均显着增加,而电压钳位比(C_R)则降低了约1.5。此外,在1000〜1050℃烧成的添加明矾的MLV中,在电应力作用下漏电流(I_L)的降低得到了明显改善。

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