Monitoring Chemical Reactions in the Solid State by EXAFS Spectroscopy: Study of the Fe-Si Binary System

摘要

Chemical reactions of the transition metal—silicon systems are of great interest because of their applicatons in electronic devices and composite materials. They also represent a typical reaction process in the solid state, which in general is not fully understood. The Fe—Si reaction couple is one of the systems that have been studied extensively. Nevertheless, many kinetic properties and microscopic details of the reaction are unknown. Synchrotron radiation is a powerful tool for investigating bonding and atomic arrangement of crystalline and amorphous solid state materials. In this contribution we report a study of the solid state reaction of the Fe—Si binary system using synchrotron radiation. We monitored the charge transfer and making and breaking of bonds in the Fe—Si binary reaction system by measuring the change of the X-ray absorption fine structure (EXAFS) of the Si K-edge.