首页> 外文期刊>Journal of the American Chemical Society >Reductive Cleavage of Sulfones and Sulfonamides by a Neutral Organic Super-Electron-Donor (S.E.D.) Reagent
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Reductive Cleavage of Sulfones and Sulfonamides by a Neutral Organic Super-Electron-Donor (S.E.D.) Reagent

机译:中性有机超电子给体(S.E.D.)试剂对砜和磺酰胺的还原裂解

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摘要

The sulfonyl group finds extensive applications in organic and medicinal chemistry both in sulfonamides, popular as robust protecting groups for amines, and in sulfones. Frequently, sulfones are introduced into synthetic schemes to assist particular transformations; further progress along the synthetic route can later require the removal of a sulfone group, and this can be achieved by reductive desulfonylation or, in the special cases of α-halo- or β-acyloxysulfones, by elimination to an alkene. For reductive removal of sulfones and for reductive cleavage of classic sulfonamides, different methods use alkali metals (Li, Na, K), lithium naphthalenide, SmI_2 with HMPA, or LiAlH_4 in the presence of nickel compounds. All these reduction methods are mediated by highly aggressive metal-containing reducing agents. Electrochemical reduction is also used for the reductive cleavage of aryl sulfones (ArSO_2R) and sulfonamides. With typical reduction potentials of —2.3 V, they pose some of the greatest challenges in functional group reduction.
机译:磺酰基在有机酰胺和药物化学中都有广泛的应用,无论是作为胺类的坚固保护基的磺酰胺还是在砜中。通常,将砜引入合成方案以协助特定的转化。沿着合成路线的进一步进展以后可能需要除去砜基团,这可以通过还原性脱磺酰化,或者在特殊情况下是α-卤代或β-酰氧基砜,通过消除烯烃来实现。为了还原去除砜并还原经典的磺酰胺,在镍化合物存在下,不同的方法使用碱金属(Li,Na,K),萘二甲酸锂,带有HMPA的SmI_2或LiAlH_4。所有这些还原方法都是由高度侵蚀性的含金属还原剂介导的。电化学还原还用于芳基砜(ArSO_2R)和磺酰胺的还原裂解。在典型的还原电位为-2.3 V的情况下,它们对官能团的还原提出了一些最大的挑战。

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