首页> 外文期刊>Journal of the American Chemical Society >Spectroscopic Identification Of Tri-n-octylphosphine Oxide(topo) Impurities And Elucidation Of Their Roles In Cadmiumrnselenide Quantum-wire Growth
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Spectroscopic Identification Of Tri-n-octylphosphine Oxide(topo) Impurities And Elucidation Of Their Roles In Cadmiumrnselenide Quantum-wire Growth

机译:光谱鉴定三正辛基膦氧化物(拓扑)杂质及其在硒化镉量子线生长中的作用

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Tri-n-octylphosphine oxide (TOPO) is the most commonly used solvent for the synthesis of colloidal nanocrystals. Here we show that the use of different batches of commercially obtained TOPO solvent introduces significant variability into the outcomes of CdSe quantum-wire syntheses. This irreproducibility is attributed to varying amounts of phosphorus-containing impurities in the different TOPO batches. We employ ~(31)P NMR to identify 10 of the common TOPO impurities. Their beneficial, harmful, or negligible effects on quantum-wire growth are determined. The impurity di-n-octylphosphinic acid (DOPA) is found to be the important beneficial TOPO impurity for the reproducible growth of high-quality CdSe quantum wires. DOPA is shown to beneficially modify precursor reactivity through ligand substitution. The other significant TOPO impurities are ranked according to their abilities to similarly influence precursor reactivity. The results are likely of general relevance to most nanocrystal syntheses conducted in TOPO.
机译:三正辛基氧化膦(TOPO)是胶体纳米晶体合成中最常用的溶剂。在这里,我们表明使用不同批次的商业获得的TOPO溶剂会在CdSe量子线合成的结果中引入明显的可变性。这种不可复制性归因于不同TOPO批次中含磷杂质的变化量。我们采用〜(31)P NMR鉴定10种常见的TOPO杂质。确定了它们对量子线生长的有益,有害或微不足道的影响。发现杂质二正辛基次膦酸(DOPA)是可再生的高质量CdSe量子线生长的重要有益TOPO杂质。已显示DOPA可通过配体取代有益地改变前体反应性。根据其他TOPO杂质对前体反应活性的影响程度,对它们进行排名。结果可能与在TOPO中进行的大多数纳米晶体合成具有普遍相关性。

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