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High-Yield Exfoliation of Ultrathin Two-Dimensional Ternary Chalcogenide Nanosheets for Highly Sensitive and Selective Fluorescence DNA Sensors

机译:高敏感度和选择性荧光DNA传感器的超薄二维三元硫族化物纳米片的高剥离率。

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摘要

High-yield preparation of ultrathin two-dimensional (2D) nanosheets is of great importance for the further exploration of their unique properties and promising applications. Herein, for the first time, the high-yield and scalable production of ultrathin 2D ternary chalcogenide nanosheets, including Ta_2NiS_5 and Ta_2NiSe_5, in solution is achieved by exfoliating their layered microflakes. The size of resulting Ta_2NiS_5 and Ta_2NiS_5 nanosheets ranges from tens of nanometers to few micrometers. Importantly, the production yield of single-layer Ta_2NiS_5 nanosheets is very high, ca. 86%. As a proof-of-concept application, the single-layer Ta_2NiS_5 is used as a novel fluorescence sensing platform for the detection of DNA with excellent selectivity and high sensitivity (with detection limit of 50 pM). These solution-processable, high-yield, large-amount ternary chalcogenide nanosheets may also have potential applications in electrocatalysis, supercapacitors, and electronic devices.
机译:高产二维超薄二维(2D)纳米片的制备对于进一步探索其独特性能和应用前景非常重要。本文中,首次通过剥落其分层的微薄片来实现溶液中包括Ta_2NiS_5和Ta_2NiSe_5在内的超薄二维三元硫族化物纳米片的高产量可扩展生产。所得的Ta_2NiS_5和Ta_2NiS_5纳米片的尺寸范围从几十纳米到几微米。重要的是,单层Ta_2NiS_5纳米片的产量非常高,大约为。 86%。作为概念验证应用,单层Ta_2NiS_5用作新型荧光传感平台,具有出色的选择性和高灵敏度(检测限为50 pM),用于检测DNA。这些可溶液处理,高产率,大量的三族硫族化物纳米片也可能在电催化,超级电容器和电子设备中具有潜在的应用。

著录项

  • 来源
    《Journal of the American Chemical Society》 |2015年第32期|10430-10436|共7页
  • 作者单位

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore;

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore;

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore,Key Laboratory for Organic Electronics and Information Display (KLOEID) and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM) Nanjing University of Posts and Telecommunications, 9 Wenyuan Road, Nanjing 210046, China;

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore;

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore;

    Institute of High Performance Computing, A~*STAR (Agency for Science, Technology and Research) 1 Fusionopolis Way, Singapore 138632, Singapore;

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore;

    Institute of Materials Research and Engineering, A~*STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore 117602, Singapore;

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore;

    Key Laboratory for Organic Electronics and Information Display (KLOEID) and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM) Nanjing University of Posts and Telecommunications, 9 Wenyuan Road, Nanjing 210046, China;

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore;

    School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore;

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  • 正文语种 eng
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