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首页> 外文期刊>Journal of Radioanalytical and Nuclear Chemistry >Acid leaching purification and neutron activation analysis of high purity silicas
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Acid leaching purification and neutron activation analysis of high purity silicas

机译:高纯二氧化硅的酸浸提纯和中子活化分析

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摘要

The effects of acids on the removal of impurity from 2N grade silica have been studied using five leaching acids: 0.2 M-oxalic acid (pH 1.5 and 2.5), c-aqua regia, 2.5%—HCl/HF, and 1%—HNO3/HF. The presence of 39 impurities in the 2N grade silica and the reference material (RM, 5N grade silica) were investigated by neutron activation analysis (NAA), X-ray fluorescence (XRF), and inductively coupled plasma mass spectrometry (ICP-MS) methods. Major impurities of the 2N silica were Al, K, Fe, Na, Ti, Ca, Mg and P. The fractions of the eight major impurities were 99.2% and 90.9% of total impurity in the 2N and RM silica, respectively. Among the leaching acids, almost all of the major impurities were removed effectively by the 2.5% HCl/HF leaching acid. All the major impurities, except for phosphorous, as well as 21 minor and trace impurities could be determined by the NAA.
机译:使用五种浸出酸研究了酸对2N级二氧化硅去除杂质的影响:0.2 M-草酸(pH 1.5和2.5),c-王水,2.5%-HCl / HF和1%-HNO 3 / HF。通过中子活化分析(NAA),X射线荧光(XRF)和电感耦合等离子体质谱(ICP-MS)研究了2N级二氧化硅和参考材料(RM,5N级二氧化硅)中39种杂质的存在方法。 2N二氧化硅的主要杂质为Al,K,Fe,Na,Ti,Ca,Mg和P。这8种主要杂质的比例分别为2N和RM二氧化硅中总杂质的99.2%和90.9%。在浸出酸中,几乎所有主要杂质均被2.5%HCl / HF浸出酸有效地去除。除磷外,所有主要杂质以及21种微量和痕量杂质均可通过NAA测定。

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