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Li diffusion in LiCoO_2 thin films prepared by pulsed laser deposition

机译:脉冲激光沉积制备LiCoO_2薄膜中的Li扩散

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摘要

Preferred c-axis oriented LiCoO_2 thin films were prepared on a Si substrate by pulsed laser deposition (PLD). The chemical diffusion coefficients, D_(li), of Li in these films were measured by electrochemical impedance spectroscopy (EIS) and potentiostatic intermittent titration technique (PITT). Du was found to be in the range of 10~(-11) to 10~(-13) cm~2 s~(-1) depending on Li concentration and on the characterization method used.
机译:优选的c轴取向的LiCoO_2薄膜是通过脉冲激光沉积(PLD)在Si衬底上制备的。通过电化学阻抗谱(EIS)和恒电位间歇滴定技术(PITT)测量了这些膜中Li的化学扩散系数D_(li)。根据Li的浓度和所用的表征方法,发现Du在10〜(-11)至10〜(-13)cm〜2 s〜(-1)的范围内。

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