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Energy flux density for higher-order cylindrical vector vortex beam tightly focused through a dielectric interface

机译:高阶圆柱形载体涡流的能量通量密度通过介电接口紧密聚焦

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Energy flux density for higher-order cylindrical vector vortex (HCVV) beam focused through a dielectric interface is analyzed numerically based on vector diffraction theory. Numerical results shows variation in the direction of the energy flux or Poynting vector distribution both in transverse and longitudinal plane upon suitably tuning the topological charge and polarization order of HCVV beam. We also note that the strong reverse flow of energy occur at the centre of the focal plane for certain values of the topological charge and polarization order. These results may find potential applications in optical trapping and optical manipulations.
机译:基于矢量衍射理论,在数值上分析聚焦通过介电接口的高阶圆柱形载体涡流(HCVV)光束的能量磁通密度。 数值结果表明,在适当地调整HCVV梁的拓扑电荷和偏振顺序时,在横向和纵向平面上的能量通量或Poynting载体分布的方向的变化。 我们还注意到,对于拓扑电荷和偏振顺序的某些值,在焦平面的中心发生强能量的强烈反向流动。 这些结果可能在光学捕获和光学操纵中找到潜在的应用。

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