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Structural characterization of iron silicides nanoparticles grown on Si substrate: Annealing rate dependence

机译:Si衬底上生长的硅化铁纳米颗粒的结构表征:退火速率依赖性

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摘要

We have synthesized iron silicides on a Si(111) substrate using an electron-beam evaporation technique in combination with thermal annealing. The microstructures, as a function of heating rate on annealing, were characterized by transmission electron microscopy (TEM). Bright-field plan-view TEM observations revealed that a discontinuous thin film is formed in the sample annealed rapidly, while complete separated nanoparticles were obtained in the specimen annealed slowly. Selected-area and nano-beam electron diffraction patterns indicated that the former and latter specimens mainly consist of iron monosilicide (ɛ-FeSi) and iron disilicide (β-FeSi2) phases, respectively.
机译:我们已经使用电子束蒸发技术结合热退火在Si(111)衬底上合成了硅化铁。通过透射电子显微镜(TEM)表征了微观结构,作为退火时加热速率的函数。亮场平面TEM观察表明,在快速退火的样品中形成了不连续的薄膜,而在缓慢退火的样品中获得了完全分离的纳米颗粒。选定区域和纳米束电子衍射图表明,前者和后者的样品分别由单硅化铁(ɛ-FeSi)相和二硅化铁(β-FeSi2)相组成。

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  • 来源
    《Journal of Materials Science》 |2006年第9期|2611-2614|共4页
  • 作者单位

    Department of Materials Science and Engineering Osaka University;

    The Institute of Scientific and Industrial Research Osaka University;

    The Institute of Scientific and Industrial Research Osaka University;

    The Institute of Scientific and Industrial Research Osaka University;

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  • 正文语种 eng
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