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Effects of negatively and positively charged Ti metal surfaces on ceramic coating adhesion and cell response

机译:带负电和带正电的钛金属表面对陶瓷涂层附着力和电池响应的影响

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摘要

This manuscript reports an evaluation of the effects of simple chemical-heat treatments on the deposition of different ceramic coatings, i.e., TiO2, CaTiO3 and CaP, on commercially pure titanium (cp-Ti) and Ti6Al4V and the influence of the coatings on cells interaction with the surfaces. The ceramic materials were prepared by the sol-gel method and the coating adhesion was analyzed by pull-off bending tests. The wettability of positively or negatively charged surfaces was characterized by contact angle measurements, which also enabled the calculation of the surface free energy through the polar-apolar liquids approach. Both acid and alkaline treatments activated the cp-Ti, whereas Ti6Al4V was only activated by the alkaline treatment. Such treatment led to increased hydrophilicity with inhibition of the fibroblastic response on Ti6Al4V. On the other hand, osteoblastic cells adhered to and proliferated on the positively and negatively charged surfaces. The maximum adhesion strength (similar to 3400N) was obtained with a negative Ti6Al4V-CaTiO3-CaP multilayer surface.
机译:该手稿报告评估了简单的化学热处理对不同的陶瓷涂层(即TiO2,CaTiO3和CaP),商业纯钛(cp-Ti)和Ti6Al4V的沉积的影响以及该涂层对细胞相互作用的影响与表面。通过溶胶-凝胶法制备陶瓷材料,并通过拉拔弯曲试验分析涂层的粘附性。带正电荷或带负电荷的表面的润湿性通过接触角测量来表征,这也使得能够通过极性-非极性液体方法计算表面自由能。酸和碱处理均激活cp-Ti,而Ti6Al4V仅通过碱处理激活。此类处理导致亲水性增加,并抑制了Ti6Al4V上的成纤维细胞反应。另一方面,成骨细胞粘附在带正电和带负电的表面并在其上增殖。 Ti6Al4V-CaTiO3-CaP多层负表面可获得最大粘合强度(类似于3400N)。

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  • 来源
    《Journal of materials science》 |2017年第2期|33.1-33.9|共9页
  • 作者单位

    Univ Sao Paulo, Sao Carlos Inst Phys, POB 369, BR-13566590 Sao Carlos, SP, Brazil|Univ Estadual Paulista, UNESP, Lab Technologycal Plasmas, Sorocaba, SP, Brazil;

    Univ Estadual Paulista, Dept Microbiol, UNESP, Botucatu, SP, Brazil;

    Univ Estadual Paulista, Dept Estat Matemat Aplicada & Computacao, UNESP, Rio Claro, SP, Brazil;

    Univ Sao Paulo, Sao Carlos Inst Phys, POB 369, BR-13566590 Sao Carlos, SP, Brazil;

    Univ Estadual Paulista, UNESP, Lab Technologycal Plasmas, Sorocaba, SP, Brazil;

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