首页> 外文期刊>Journal of materials science >Tunable dielectric properties of sol-gel derived (Pb_(0.35), Sr_(0.65)) (Zr_(0.5), Ti_(0.5))O_3 thin films for microwave application
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Tunable dielectric properties of sol-gel derived (Pb_(0.35), Sr_(0.65)) (Zr_(0.5), Ti_(0.5))O_3 thin films for microwave application

机译:溶胶 - 凝胶的可调谐介电性质(PB_(0.35),SR_(0.65))(Zr_(0.5),Ti_(0.5))O_3微波应用的薄膜

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摘要

Ferroelectric (Pb_(0.35)Sr_(0.65))(Zr_(0.5)Ti_(0.5))O_3 material with Curie temperature below room temperature was prepared by solution-gelation method on platinized silicon substrates. Structural and morphological evolution of the spin-coated films on Pt/ZrO_2/SiO_2/Si substrates as a function of annealing temperature were studied by X-ray diffraction and atomic force microscopy, respectively. Fully crystallized film with perovskite structure was obtained at an annealing temperature of 600 °C. Root-mean-square roughness of the 300 nm film was around 4.5 nm, manyfold higher than the underlying Pt substrate (~ 1 nm). Electrical properties of the fully crystallized films were studied as functions of frequency and temperature with an impedance analyzer. Dielectric constant and loss tangent were around 200 and 0.02, respectively, at a frequency 100 kHz. Dielectric tunability of the films with bias voltage and frequencies was studied and 45% tunability obtained at 500 kV/cm. The quality factor or the figure of merit of the (Pb_(0.35)Sr_(0.65))(Zr_(0.5)Ti_(0.5))O_3 films were determined from the tunability /loss tangent ratio and found to be 16 at 500 kV/cm.
机译:通过溶液 - 凝胶化方法在镀层硅基衬底上制备铁电(PB_(0.5)SR_(0.65))(Zr_(0.5)Ti_(0.5)Ti_(0.5))O_3材料。通过X射线衍射和原子力显微镜分别研究了作为退火温度函数的Pt / ZrO_2 / SiO_2 / Si衬底上的旋涂膜的结构和形态学。在600℃的退火温度下获得具有钙钛矿结构的完全结晶的膜。 300nm膜的根部平均方形粗糙度为约4.5nm,多重高于下面的pt衬底(〜1nm)。使用阻抗分析仪研究了完全结晶薄膜的电性能作为频率和温度的函数。介电常数和损耗切线分别为200%和0.02,以100kHz频率。研究了具有偏置电压和频率的膜的介电可调性,并且在500kV / cm处获得了45%的可调性。质量因数或(PB_(0.35)SR_(0.65))的优点(Zr_(0.5)Ti_(0.5))O_3膜的功率因数或Zr_(0.5))o_3薄膜从可调性/损失切线率确定,发现为500kV / /厘米。

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  • 来源
    《Journal of materials science》 |2021年第14期|19095-19101|共7页
  • 作者单位

    School of Chemical Engineering and Physical Sciences Lovely Professional University Jalandhar-Delhi G.T. Road Phagwara Punjab 144411 India;

    School Electrical Engineering and Electronics Lovely Professional University Jalandhar-Delhi G.T. Road Phagwara Punjab 144411 India;

    School of Computer Science and Engineering Lovely Professional University Jalandhar Delhi G.T. Road Phagwara Punjab 144411 India Division of Research and Development Lovely Professional University Jalandhar Delhi G.T. Road Phagwara Punjab 144411 India;

    CSIR-National Physical Laboratory Dr. K. S. Krishnan Marg New Delhi 110012 India;

    School of Chemical Engineering and Physical Sciences Lovely Professional University Jalandhar-Delhi G.T. Road Phagwara Punjab 144411 India Division of Research and Development Lovely Professional University Jalandhar Delhi G.T. Road Phagwara Punjab 144411 India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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