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首页> 外文期刊>Journal of materials science >Enhanced current carrying ability for GaBa_2Cu_3O_(7-x) films deposited with negative bias by RF magnetic sputtering method
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Enhanced current carrying ability for GaBa_2Cu_3O_(7-x) films deposited with negative bias by RF magnetic sputtering method

机译:通过RF磁性溅射法沉积有负偏压的GABA_2CU_3O_(7-X)膜的增强电流承载能力

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摘要

GaBa_2Cu_3O_(7-x) films were prepared on LaAlO_3 substrate by RF magnetic sputtering with different temperature and negative bias from 800 to 860 °C and 0 v to - 90 v, respectively. We investigate the relationship between temperature and negative bias and the performance of the film to analyze the most suitable deposition conditions. The surface texture and structure of GaBa_2Cu_3O_(7-x) films were observed by X-ray diffraction (XRD), Raman measurement, field emission scanning electron microscope (FESEM). The superconducting properties were measured by physical property measurement system (PPMS). It was found that the structure, surface morphology, and superconducting property of GaBa_2Cu_3O_(7-x) film are seriously affected by the temperature and negative bias. The crystallinity and surface quality of the film first increases and then decreases with the increase in the deposition temperature, and reach the best at 840 °C. In order to further improve the performance of the film, a negative bias voltage of 0 to - 90v was applied on the basis of this temperature, and the best quality film was obtained under a negative bias of - 30 v. The surface of the film prepared under the conditions of 840 °C and - 30v is the most dense and uniform, and the critical current density reaches 0.16MA/cm~2, which is almost 3 times higher than that of the film prepared without negative bias.
机译:通过RF磁溅射在Laalo_3基板上用不同的温度和800至860℃和0V至-90V的负偏压在Laalo_3基板上制备GABA_2CU_3O_(7-X)膜。我们调查温度与负偏差之间的关系以及薄膜的性能分析最合适的沉积条件。通过X射线衍射(XRD),拉曼测量,场发射扫描电子显微镜(FESEM)观察GABA_2CU_3O_(7-X)膜的表面纹理和结构。通过物理性质测量系统(PPMS)测量超导性能。发现GABA_2CU_3O_(7-X)膜的结构,表面形态和超导性受到温度和负偏压的严重影响。膜的结晶度和表面质量首先增加,然后随着沉积温度的增加而降低,并在840℃下达到最佳。为了进一步提高膜的性能,基于该温度施加0至-90V的负偏置电压,并且在30V的负偏压下获得最佳质量膜。薄膜的表面在840°C和-30V的条件下制备是最致密且均匀的,临界电流密度达到0.16mA / cm〜2,这几乎比没有负偏压的膜的薄膜高出3倍。

著录项

  • 来源
    《Journal of materials science 》 |2020年第21期| 19056-19063| 共8页
  • 作者单位

    Department of Physics and Mathematics Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power Shanghai University of Electric Power 1851# Hucheng Huan Road Shanghai 201303 People's Republic of China;

    Department of Physics and Mathematics Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power Shanghai University of Electric Power 1851# Hucheng Huan Road Shanghai 201303 People's Republic of China;

    Department of Physics and Mathematics Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power Shanghai University of Electric Power 1851# Hucheng Huan Road Shanghai 201303 People's Republic of China;

    Department of Physics and Mathematics Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power Shanghai University of Electric Power 1851# Hucheng Huan Road Shanghai 201303 People's Republic of China Department of Materials Science Fudan University Shanghai 200433 People's Republic of China;

    Department of Physics and Mathematics Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power Shanghai University of Electric Power 1851# Hucheng Huan Road Shanghai 201303 People's Republic of China;

    Department of Physics and Mathematics Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power Shanghai University of Electric Power 1851# Hucheng Huan Road Shanghai 201303 People's Republic of China;

    Department of Physics and Mathematics Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power Shanghai University of Electric Power 1851# Hucheng Huan Road Shanghai 201303 People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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