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首页> 外文期刊>Journal of materials science >Unexpected ferromagnetism in n-type polycrystalline K-doped ZnO films prepared by RF-magnetron sputtering
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Unexpected ferromagnetism in n-type polycrystalline K-doped ZnO films prepared by RF-magnetron sputtering

机译:射频磁控溅射制备n型多晶K掺杂ZnO薄膜中的意外铁磁性

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摘要

The room temperature ferromagnetism in highly c-axis orientated K-doped ZnO polycrystalline films prepared by RF-magnetron sputtering were systematically investigated in this work. The decrease of n-type carriers and the enhanced acceptor-related photoluminescence with the K doping imply the formation of K substitution and Zn vacancy defects. It can be speculated that the room-temperature ferromagnetism observed in K-doped ZnO polycrystalline films is related with the hole. Since the saturation magnetization was positively dependent on the amount of hole defects based on the PL spectra analysis. The ferromagnetism coupling and the room temperature ferromagnetism obtained in K-doped ZnO polycrystalline films thus is originated from p-p coupling of the surrounding O atoms of the K substitution and Zn vacancy defects. The co-existing of both the n-type conductivity and the ferromagnetism induced by localized holes, which is much different from the previous report for epitaxial samples, give new insight into the behavior of d~0 ferromagnetism in oxides.
机译:在这项工作中,系统地研究了通过射频磁控溅射制备的高c轴取向的K掺杂ZnO多晶膜中的室温铁磁性。 n型载流子的减少和与K掺杂增强的受体相关的光致发光意味着形成K取代和Zn空位缺陷。可以推测,在掺K的ZnO多晶膜中观察到的室温铁磁性与空穴有关。由于基于PL光谱分析,饱和磁化强度正好取决于孔缺陷的数量。因此,在K掺杂的ZnO多晶膜中获得的铁磁性耦合和室温铁磁性源自于K取代周围的O原子和Zn空位缺陷的p-p耦合。 n型电导率和局部空穴引起的铁磁性的共存与以前关于外延样品的报道大不相同,这为氧化物中d〜0铁磁性的行为提供了新的认识。

著录项

  • 来源
    《Journal of materials science》 |2015年第11期|8451-8455|共5页
  • 作者单位

    Department of Applied Physics, Institute of Advanced Materials Physics, Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Faculty of Science, Tianjin University, Tianjin 300072, People's Republic of China;

    Department of Applied Physics, Institute of Advanced Materials Physics, Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Faculty of Science, Tianjin University, Tianjin 300072, People's Republic of China;

    Department of Applied Physics, Institute of Advanced Materials Physics, Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Faculty of Science, Tianjin University, Tianjin 300072, People's Republic of China;

    Department of Applied Physics, Institute of Advanced Materials Physics, Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Faculty of Science, Tianjin University, Tianjin 300072, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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