首页> 外文期刊>Journal of materials science >Effect of annealing on the structural, optical, electrical and photocatalytic activity of ZrO_2-TiO_2 nanocomposite thin films prepared by sol-gel dip coating technique
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Effect of annealing on the structural, optical, electrical and photocatalytic activity of ZrO_2-TiO_2 nanocomposite thin films prepared by sol-gel dip coating technique

机译:退火对溶胶-凝胶浸涂法制备ZrO_2-TiO_2纳米复合薄膜的结构,光学,电和光催化活性的影响

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摘要

Abstract ZrO2–TiO2 nanocomposite thin films were deposited onto quartz substrate by sol–gel dip coating technique. The structural, morphological, optical, electrical and photocatalytic properties of the films were studied for different annealing temperatures (500, 800 and 1200 °C). X-ray diffraction pattern of films annealed at 500 °C showed amorphous nature. Increase in crystallinity was observed in the films annealed at higher temperature. Films annealed at higher temperature showed the formation of orthorhombic ZrTiO4 phase. Field emission scanning electron microscopy (FESEM) revealed crack free surface and surface roughness was found to increase with increase in annealing temperature. Energy dispersive X-ray analysis confirmed the presence of Zr, Ti and O in these films. Band gap of the films decreased from 3.93 to 3.50 eV with increase in annealing temperature. Photoluminescence spectra of the films exhibited emission peaks in both UV and visible region of the electromagnetic spectra. The conductivity of the films increased with increase in annealing temperature. Photocatalytic activity of these films evaluated by monitoring the degradation of methylene blue solution increased with increase in annealing temperature.
机译: Abstract ZrO 2 –TiO 2 纳米复合薄膜通过溶胶-凝胶浸涂技术沉积在石英衬底上。研究了在不同的退火温度(500、800和1200 C)下薄膜的结构,形态,光学,电学和光催化性能。在500°C退火的薄膜的X射线衍射图显示出非晶态。在较高温度下退火的膜中观察到结晶度的增加。高温退火后的薄膜显示出正交晶ZrTiO 4 相的形成。场发射扫描电子显微镜(FESEM)显示无裂纹的表面,发现表面粗糙度随退火温度的升高而增加。能量色散X射线分析证实了这些膜中存在Zr,Ti和O。随着退火温度的升高,薄膜的带隙从3.93 eV降低到3.50 eV。薄膜的光致发光光谱在电磁光谱的紫外线和可见光区域均显示出发射峰。膜的电导率随着退火温度的升高而增加。通过监测亚甲基蓝溶液的降解评价这些薄膜的光催化活性随退火温度的升高而增加。

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  • 来源
    《Journal of materials science》 |2017年第14期|10541-10554|共14页
  • 作者单位

    Thin Film Lab, Post Graduate and Research Department of Physics, Mar Ivanios College;

    Department of Physics, NSS College Pandalam;

    Thin Film Lab, Post Graduate and Research Department of Physics, Mar Ivanios College,Department of Physics, Heera College of Engineering and Technology;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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