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Structural, morphological, optical and hologram recording of the CdS and ZnS thin films by double exposure digital holographic interferometry technique

机译:通过二次曝光数字全息干涉技术记录CdS和ZnS薄膜的结构,形态,光学和全息图

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摘要

Abstract In this paper, we have used double exposure digital holographic interferometry (DEDHI) technique for hologram recording of electrochemical synthesis of the CdS and ZnS thin films materials. As synthesis CdS and ZnS thin films are characterized by different characterization techniques such as X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM), optical band gap,  and contact angle measurement. Further recording of  the holograms has been carried out with different deposition time of CdS and ZnS thin films, and we have used mathematical relation between stress, mass deposited thickness of thin film and fringe width. It is seen that the fringe width, mas of deposited samples, stress to substrate changes with the time of deposition.
机译:摘要 在本文中,我们将双曝光数字全息干涉技术(DEDHI)用于全息记录CdS和ZnS薄膜材料的电化学合成。由于合成CdS和ZnS薄膜的特征在于不同的表征技术,例如X射线衍射(XRD),场发射扫描电子显微镜(FE-SEM),光学带隙和接触角测量。全息图的进一步记录是在CdS和ZnS薄膜的沉积时间不同的情况下进行的,我们使用了应力,薄膜的质量沉积厚度和边缘宽度之间的数学关系。可以看出,边缘宽度,沉积样品的质量,对衬底的应力随沉积时间而变化。

著录项

  • 来源
    《Journal of materials science》 |2017年第10期|7385-7392|共8页
  • 作者单位

    Department of Biological and Environmental Science, Dongguk University;

    Holography and Material Research Laboratory, Department of Physics, Shivaji University;

    Jaysingpur College;

    Holography and Material Research Laboratory, Department of Physics, Shivaji University;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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