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首页> 外文期刊>Journal of materials science >Properties of nanostructured pure β-In_2S_3 thin films prepared by sulfurization-assisted electrodeposition
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Properties of nanostructured pure β-In_2S_3 thin films prepared by sulfurization-assisted electrodeposition

机译:硫化辅助电沉积制备的纳米结构纯β-In_2S_3薄膜的性能

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摘要

The development of pure-phase semi-conducting buffering materials as the substitution of conventional cadmium sulfide (CdS) is extremely important for the large-scale application of solar cells. Herein, we demonstrated a facile approach to deposit pure-phase indium sulfide (In_2S_3) thin films on the indium tin oxide (ITO) substrates by sulfurizing the co-electrodeposited In_2S_3 films. The effect of sulfurization temperatures (200-550 ℃) on the surface morphologies, crystal structures, optical and electrical properties of In_2S_3 films was investigated. The results showed that the highly-oriented pure β-In_2S_3 thin films were obtained as the sulfurization temperature exceeded 250 ℃. The obtained β-In_2S_3 films possessed a relatively ideal S/In atomic ratio and a continuous and densely packed surface feature. The optical band gaps of the β-In_2S_3 films have been determined in the range of 1.93±0.01-2.06±0.01 eV, which can be controlled by adjusting the sulfurization temperature. The electrical properties tests demonstrated that the pure β-In_2S_3 films obtained by sulfurizing at 550 ℃ exhibited the characteristic n-type semiconductors with a low electrical resistivity of 38.8 Ω cm, a carrier concentration of 3.8×10~(15) cm~(-3) and a carrier mobility of 42.3 cm~2 V~(-1) s~(-1). This facile synthetic route is promising for the preparation of pure-phase In_2S_3 films, and then gives the guidance for future design and synthesis of other metal sulfide films for high-performance solar cells.
机译:开发纯相半导体缓冲材料以替代常规硫化镉(CdS)对于太阳能电池的大规模应用极为重要。在这里,我们展示了一种通过将共电沉积的In_2S_3膜硫化来在铟锡氧化物(ITO)衬底上沉积纯相硫化铟(In_2S_3)薄膜的简便方法。研究了硫化温度(200-550℃)对In_2S_3薄膜表面形貌,晶体结构,光电性能的影响。结果表明,当硫化温度超过250℃时,可获得高取向的纯β-In_2S_3薄膜。所得的β-In_2S_3薄膜具有相对理想的S / In原子比和连续密集的表面特征。 β-In_2S_3薄膜的光学带隙确定在1.93±0.01-2.06±0.01 eV的范围内,可以通过调节硫化温度来控制。电学性能测试表明,在550℃条件下硫化得到的纯β-In_2S_3薄膜具有低电阻率为38.8Ωcm,载流子浓度为3.8×10〜(15)cm〜(-)的特性n型半导体。 3),载流子迁移率为42.3 cm〜2 V〜(-1)s〜(-1)。这种简便的合成路线有望用于制备纯相In_2S_3薄膜,然后为将来设计和合成用于高性能太阳能电池的其他金属硫化物薄膜提供指导。

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  • 来源
    《Journal of materials science 》 |2017年第6期| 5044-5052| 共9页
  • 作者单位

    State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, People's Republic of China;

    State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, People's Republic of China;

    State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, People's Republic of China;

    State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, People's Republic of China;

    State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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