机译:后退火对混合HfO_2-TiO_2薄膜涂层光学和电学性能的影响
Wroclaw Univ Sci & Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland;
Wroclaw Univ Sci & Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland;
Wroclaw Univ Sci & Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland;
Wroclaw Univ Sci & Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland;
Wroclaw Univ Sci & Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland;
Wroclaw Univ Sci & Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland;
Polish Acad Sci, Inst Met & Mat Sci, Reymonta 25, PL-30059 Krakow, Poland;
机译:后退火温度对TiO_2-WO_3混合薄膜结构,光学,机械和腐蚀性能的影响
机译:退火温度对溶胶 - 凝胶旋涂衍生的Cu2zNSN4薄膜结构,光学和电性能的影响
机译:厚度和硫退火气氛对通过浸涂技术制备的Cu(2)ZnSNS4薄膜的结构,光学和电性能的影响
机译:溶胶凝胶浸涂技术沉积锑氧化锑纤维薄膜结构,电气和光学性能的退火效应
机译:原位热退火工艺对脉冲激光沉积制造CDS Cdte薄膜太阳能电池结构,光学和电性能的影响
机译:快速热退火对原子层沉积生长Zr掺杂ZnO薄膜的结构电学和光学性质的影响
机译:退火气氛对旋涂制备的CZTS薄膜结构和光学性质的影响