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首页> 外文期刊>Journal of Materials Research >Giant magnetoimpedance and stress-impedance effects in multilayered FeSiB/Cu/FeSiB films with a meander structure
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Giant magnetoimpedance and stress-impedance effects in multilayered FeSiB/Cu/FeSiB films with a meander structure

机译:具有曲折结构的多层FeSiB / Cu / FeSiB薄膜中的巨磁阻抗和应力阻抗效应

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摘要

Giant magnetoimpedance (GMI) and giant stress-impedence (GSI) effects were realized in multilayered FeSiB/Cu/FeSiB films with a meander structure by magnetron sputtering on thin glass substrates. The GMI and GSI effects were studied in the frequency range of 1―40 MHz for the multilayered FeSiB/Cu/FeSiB films. Experimental results show that a large negative GMI ratio of -23% is obtained at H_a= 12 kA/m for a frequency of 20 MHz. The GSI ratio is -20% for a frequency of 1 MHz with the deflection of 150 μm of the multilayered FeSiB/Cu/FeSiB films. The GSI effect is attractive for stress or pressure sensor applications.
机译:通过在薄玻璃基板上进行磁控溅射,在具有曲折结构的多层FeSiB / Cu / FeSiB多层膜中实现了巨磁阻抗(GMI)和巨应力阻抗(GSI)效应。研究了多层FeSiB / Cu / FeSiB薄膜在1-40 MHz频率范围内的GMI和GSI效应。实验结果表明,对于20 MHz的频率,在H_a = 12 kA / m时可获得-23%的较大负GMI比。多层FeSiB / Cu / FeSiB薄膜的挠度为150μm时,对于1 MHz的频率,GSI比为-20%。 GSI效应对于应力或压力传感器应用具有吸引力。

著录项

  • 来源
    《Journal of Materials Research》 |2003年第4期|p.868-871|共4页
  • 作者单位

    Key Laboratory for Thin Film and Mlcrofabricatlon of Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Huashan Road 1954, Shanghai 200030, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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